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Volumn , Issue , 2009, Pages 1914-1919

Dry-film technology as a standard process for passive optical alignment of silicon photonics devices

Author keywords

[No Author keywords available]

Indexed keywords

FILM STRUCTURE; FILM TECHNOLOGY; INTEGRATED OPTICAL DEVICES; LOW COSTS; MASS PRODUCTION; MICROELECTRONIC INDUSTRY; OPTICAL ALIGNMENTS; PARALLEL OPTICS; SILICON NANOWIRES; SILICON PHOTONICS; SMART SOLUTIONS; TRANSFER TECHNIQUE; VERTICAL GRATINGS;

EID: 70349656033     PISSN: 05695503     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ECTC.2009.5074281     Document Type: Conference Paper
Times cited : (3)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.