Using quantum dots to tag subsurface damage in lapped and polished glass samples

Applied Optics

Volumn 48, Issue 27, 2009, Pages 5155-5163

  Williams, Wesley B ^a   Mullany, Brigid A ^a   Parker, Wesley C ^b   Moyer, Patrick J ^b   Randles, Mark H ^c  

^a University of North Carolina at Charlotte   (United States)

^b UNIVERSITY OF NORTH CAROLINA AT CHARLOTTE   (United States)

^c NORTHROP GRUMMAN CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABERRATIONS; ATOMIC FORCE MICROSCOPY; FLUORESCENCE; FLUORESCENCE MICROSCOPY; GLASS; LAPPING; LASER DAMAGE; NANOCRYSTALS; POLISHING; SURFACE DEFECTS;

CHEMICAL INTERACTIONS; CONFOCAL FLUORESCENCE MICROSCOPY; FLUORESCENT PARTICLE; INTERFEROMETRIC MICROSCOPY; LAPPING AND POLISHING; LASER INDUCED DAMAGE THRESHOLDS; NONDESTRUCTIVE METHODS; OSCILLATING COMPONENTS;

SEMICONDUCTOR QUANTUM DOTS;

EID: 70349490152     PISSN: 1559128X     EISSN: 15394522     Source Type: Journal    
DOI: 10.1364/AO.48.005155     Document Type: Article

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