Application of high refractive index fluid to KrF-immersion lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6153 I, Issue , 2006, Pages

  Yada, Yuji ^a   Ito, Koji ^a   Yamaguchi, Yoshikazu ^a   Furukawa, Taiichi ^a   Miyamatsu, Takashi ^a   Wang, Yong ^a   Hieda, Katsuhiko ^a   Shimokawa, Tsutomu ^a  

^a JSR CORPORATION   (Japan)

Author keywords

High refractive index immersion fluid; KrF immersion lithography; Leaching; Lithographic performance; Optical characteristic; Photoresist

Indexed keywords

FLUIDS; LEACHING; LITHOGRAPHY; OPTICAL PROPERTIES; REFRACTIVE INDEX;

HIGH REFRACTIVE INDEX IMMERSION FLUID; KRF IMMERSION LITHOGRAPHY; LITHOGRAPHIC PERFORMANCE; OPTICAL CHARACTERISTIC;

PHOTORESISTS;

EID: 33745608236     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.655983     Document Type: Conference Paper

References (7)

1. S. Peng et al., "Second-generation fluids for 193-nm immersion lithography," Proceedings of SPIE, 5754, 427, 2005.
2. T. Miyamatsu et al., "Material design for immersion lithography with high-refractive index fluid," Proceedings of SPIE, 5753, 10, 2005.
3. H.Sewell et al., "32nm Node Technology Development using Interference Immersion Lithography," Proceedings of SPIE, 5753, 491, 2005.
4. Bum J. Lin, "The k3 coefficient in nonparaxial λ/NA scaling equations for resolution. Depth of focus, and immersion lithography". Journal of Microlithography, Microfablication, and Microsystems, 1(1), 7, 2002
5. R. R. Kunz et al., "Transparent fluids for 157-nm immersion lithography" Journal of Microlithography, Microfablication, and Microsystems, 4(1), 2005
6. S. G. Kaplan et al. "Characterization of refractive properties of fluids for immersion photolithography", International Symposium on Immersion and 157nm Lithography, Aug. 2-5, 2004.
7. S. Kishimura et al., "Photoresist interaction in 193-/157-nm immersion lithography", Proceedings of SPIE, 5376,44, 2004