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Volumn , Issue , 2009, Pages 59-62

3D technologies: Requiring more than 3 dimensions from concept to product

(1)  Swinnen, B a  

a IMEC   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

3-DIMENSION; 3D TECHNOLOGY; DESIGN REQUIREMENTS; MATERIALS DEVELOPMENT; TECHNOLOGY ROADMAPPING;

EID: 70349448675     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IITC.2009.5090340     Document Type: Conference Paper
Times cited : (6)

References (12)
  • 1
    • 0035714371 scopus 로고    scopus 로고
    • Technologies for very high bandwidth electrical interconnects between next generation VLSI crcuits
    • Technical digest, December 2-5, Washington D.C
    • E. Beyne, "Technologies for very high bandwidth electrical interconnects between next generation VLSI crcuits", IEEE-IEDM 2001 Technical digest, December 2-5, Washington D.C., S23-P3, 2001
    • (2001) IEEE-IEDM
    • Beyne, E.1
  • 2
    • 2442641371 scopus 로고    scopus 로고
    • 3D interconnection and packaging: Impending reality or still a dream?
    • February 15-19, San Francisco, CA, pp
    • E. Beyne, "3D interconnection and packaging: impending reality or still a dream?", IEEE ISSCC 2004, February 15-19, San Francisco, CA, pp. 138-148
    • (2004) IEEE ISSCC , pp. 138-148
    • Beyne, E.1
  • 4
    • 70349455135 scopus 로고    scopus 로고
    • K. W. Guarini, et al. 3D IC Technology: Capabilities and Applications; proceedings 3D Architectures for Semiconductor Integration and packaging, RTI international, Burlingame, June 13-15, 2004.
    • K. W. Guarini, et al. "3D IC Technology: Capabilities and Applications"; proceedings "3D Architectures for Semiconductor Integration and packaging", RTI international, Burlingame, June 13-15, 2004.
  • 5
    • 70349441349 scopus 로고    scopus 로고
    • A.Klump et al. 3D Integration of CMOS Transistors with ICV-SLID Technology; proceedings 3D Architectures for Semiconductor Integration and packaging, RTI international, Burlingame, June 13-15, 2005.
    • A.Klump et al. "3D Integration of CMOS Transistors with ICV-SLID Technology"; proceedings "3D Architectures for Semiconductor Integration and packaging", RTI international, Burlingame, June 13-15, 2005.
  • 6
    • 24644439334 scopus 로고    scopus 로고
    • Wafer Bonding of Damascene-Patterned Metal/Adhesive Redistribution Layers for Via-First Three-Dimensional (3D) Interconnect
    • New Jersey, pp
    • McMahon J.J., Lu J.-Q., Gutmann R.J. (2005) "Wafer Bonding of Damascene-Patterned Metal/Adhesive Redistribution Layers for Via-First Three-Dimensional (3D) Interconnect" Proceeding of the 55th Electronic Components and Technology conference. IEEE, New Jersey, pp. 331 - 336
    • (2005) Proceeding of the 55th Electronic Components and Technology conference. IEEE , pp. 331-336
    • McMahon, J.J.1    Lu, J.-Q.2    Gutmann, R.J.3
  • 10
    • 70349463380 scopus 로고    scopus 로고
    • Wafer Level 3-D ICs Process Technology, Ed. by C. S. Tan, R. J. Gutmann, L. R. Reif, 2009, Springer
    • Wafer Level 3-D ICs Process Technology, Ed. by C. S. Tan, R. J. Gutmann, L. R. Reif, 2009, Springer
  • 11
    • 70349471499 scopus 로고    scopus 로고
    • The International Technology Roadmap for Semiconductors, http://www.itrs.net/
  • 12
    • 70349458249 scopus 로고    scopus 로고
    • Jisso: http://jisso.ipc.org/#
    • Jisso: http://jisso.ipc.org/#


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.