SCOPUS 정보 검색 플랫폼

Plasma Processes and Polymers

Volumn 4, Issue SUPPL.1, 2007, Pages S166-S170

Deposition of cubic boron nitride in a supersonic plasma jet reactor with secondary discharge

(3) McLaren, Jami a Akasaka, Hiroki b Heberlein, Joachim a

a UNIVERSITY OF MINNESOTA (United States)

b TOKYO INSTITUTE OF TECHNOLOGY (Japan)

Author keywords

Bias; FT IR; Ion bombardment; Nanocrystalline films; Plasma enhanced chemical vapor deposition; Plasma jet

Indexed keywords

ELECTRIC DISCHARGES; FOURIER TRANSFORM INFRARED SPECTROSCOPY; III-V SEMICONDUCTORS; ION BOMBARDMENT; NANOCRYSTALS; PLASMA CVD; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMA JETS; SCANNING ELECTRON MICROSCOPY; SUPERSONIC AERODYNAMICS; THIN FILMS; THRESHOLD VOLTAGE;

BIAS; BORON NITRIDE THIN FILMS; MICRO X-RAY-DIFFRACTION; NANO-CRYSTALLINE FILMS; NEGATIVE SUBSTRATES; PULSE FREQUENCIES; SECONDARY DISCHARGES; SUPERSONIC PLASMA;

CUBIC BORON NITRIDE;

EID: 70349414503 PISSN: 16128850 EISSN: 16128869 Source Type: Journal
DOI: 10.1002/ppap.200730604 Document Type: Conference Paper

Times cited : (3)

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