Two-dimensional optical emission imaging of a pulsed supersonic plasma jet

IEEE Transactions on Plasma Science

Volumn 27, Issue 1, 1999, Pages 100-101

  Postal, Olivier P ^a   Heberlein, Joachim V R ^a  

^a University of Minnesota   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BORON CARBIDE; BORON COMPOUNDS; CHEMICAL REACTORS; CHEMICAL VAPOR DEPOSITION; COATINGS; DISSOCIATION; ELECTRIC DISCHARGES; EMISSION SPECTROSCOPY; FILM GROWTH; IMAGING TECHNIQUES; METHANE; THIN FILMS;

CHEMICAL VAPOR DEPOSITION REACTOR; HARD COATING; PULSED BIAS; PULSED SUPERSONIC PLASMA JET; SECONDARY DISCHARGE; THERMAL DISSOCIATION;

PLASMA JETS;

EID: 0032674981     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/27.763064     Document Type: Article

References (3)

1. O. Postel, N. Otake, and J. Heberlein, "Plasma CVD of boron carbide thin films," in Proc. 13th Int. Symp. Plasma Chem., Beijing, China, 1997, pp. 1088-1093.
2. O. Postel and J. Heberlein, "Deposition of boron carbide thin film by supersonic plasma jet CVD with secondary discharge," Surf. Coatings Technol., vol. 108-109, pp. 247-252, 1998.
3. m calculated at the G-2 level of theory," J. Phys. Chem., vol. 98, no. 11178, pp. 11178-11180, 1994.