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Volumn 108-109, Issue , 1998, Pages 247-252

Deposition of boron carbide thin film by supersonic plasma jet CVD with secondary discharge

Author keywords

Boron carbide; Hard coating; Plasma jet CVD; Positive bias

Indexed keywords

BORON CARBIDE; CHEMICAL VAPOR DEPOSITION; CRYSTAL ORIENTATION; CRYSTALLINE MATERIALS; FILM GROWTH; MECHANICAL VARIABLES MEASUREMENT; METHANE; PLASMA JETS; SILICON; SUBSTRATES; THERMAL EFFECTS; VICKERS HARDNESS TESTING;

EID: 0040610697     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(98)00661-6     Document Type: Article
Times cited : (44)

References (22)
  • 2
    • 0039447894 scopus 로고    scopus 로고
    • US patents #4,594,294, #4,590,031, #4,619,865, #4,643,951, #4,716,083 and #4,645,715
    • E. Eichen et al. US patents #4,594,294, #4,590,031, #4,619,865, #4,643,951, #4,716,083 and #4,645,715.
    • Eichen, E.1
  • 7
    • 0040633362 scopus 로고    scopus 로고
    • General Motor R&D Center, Warren, MI, USA, private communication (submitted to
    • K.W. Lee, S.J. Harris, General Motor R&D Center, Warren, MI, USA, private communication (submitted to Diamond Rel. Mater.).
    • Diamond Rel. Mater.
    • Lee, K.W.1    Harris, S.J.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.