Carbon based Si- and Cr-containing thin films: Chemical and nanomechanical properties

Solid State Sciences

Volumn 11, Issue 10, 2009, Pages 1788-1792

  Bertoti I ^a   Mohai, M ^a   Kereszturi, K ^a   Toth A ^a   Kalman E ^a  

^a CHEMICAL RESEARCH CENTER   (Hungary)

Author keywords

a C films; Chemical structure; Composition; Cr and Si alloying elements; Nanomechanical properties; XPS

Indexed keywords

A-C FILMS; CHEMICAL STRUCTURE; COMPOSITION; CR AND SI ALLOYING ELEMENTS; NANOMECHANICAL PROPERTIES; XPS;

ALLOYING; ALLOYING ELEMENTS; AUGER ELECTRON SPECTROSCOPY; CARBON FILMS; CHEMICAL VAPOR DEPOSITION; CHROMIUM; MAGNETRONS; SEMICONDUCTING SILICON COMPOUNDS; SILICIDES; SILICON; STRUCTURE (COMPOSITION); X RAY PHOTOELECTRON SPECTROSCOPY;

SILICON WAFERS;

EID: 70349323325     PISSN: 12932558     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.solidstatesciences.2009.02.029     Document Type: Article

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