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Applied Physics A: Materials Science and Processing

Volumn 97, Issue 2, 2009, Pages 271-276

Cross-sectional morphological profiles of ripples on Si, SiC, and HOPG

(5) Tomita, Takuro a Kumai, Ryota a Matsuo, Shigeki a Hashimoto, Shuichi a Yamaguchi, Makoto b

a UNIVERSITY OF TOKUSHIMA (Japan)

b HOSEI UNIVERSITY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CONVEX SHAPES; CROSS SECTION; CROSS SECTIONAL PROFILES; DIRECT OBSERVATION; FEMTOSECOND LASER IRRADIATION; HIGHLY ORIENTED PYROLYTIC GRAPHITE; MORPHOLOGICAL PROFILE; PHASE CONVERSION; RIPPLE FORMATION; RIPPLE STRUCTURE;

ASPECT RATIO; GRAPHITE; PROFILOMETRY; PULSED LASER APPLICATIONS; SCANNING ELECTRON MICROSCOPY; SILICON CARBIDE;

SILICON;

EID: 70349272149 PISSN: 09478396 EISSN: 14320630 Source Type: Journal
DOI: 10.1007/s00339-009-5364-2 Document Type: Article

Times cited : (22)

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