Organic depth profiling of a binary system: The compositional effect on secondary ion yield and a model for charge transfer during secondary Ion emission

Journal of Physical Chemistry B

Volumn 113, Issue 34, 2009, Pages 11574-11582

  Shard, Alexander G ^a,d   Rafati, Ali ^b   Ogaki, Ryosuke ^b,d   Lee, Joanna L S ^a   Hutton, Simon ^c   Mishra, Gautam ^c   Davies, Martyn C ^b   Alexander, Morgan R ^b  

^a NATIONAL PHYSICAL LABORATORY   (United Kingdom)

^b UNIVERSITY OF NOTTINGHAM   (United Kingdom)

^c Kratos Analytical Ltd   (United Kingdom)

^d AARHUS UNIVERSITY   (Denmark)

Author keywords

[No Author keywords available]

Indexed keywords

BINARY MIXTURES; CHARGE TRANSFER; DEPTH PROFILING; ION BEAMS; ION EXCHANGE; SECONDARY EMISSION; SECONDARY ION MASS SPECTROMETRY; SPUTTERING; SURFACES; SYSTEMS (METALLURGICAL);

ANALYTICAL TECHNIQUES; ANALYTICAL TOOL; BINARY SYSTEMS; CLUSTER ION BEAMS; COMPOSITIONAL EFFECTS; CONCENTRATION OF; DEPTH PROFILE; HIGH MOLECULAR MASS; MODEL SYSTEM; NEAR SURFACE REGIONS; ORGANIC DEPTH PROFILING; ORGANIC MATERIALS; ORGANIC SPECIES; POLY(LACTIDE); PURE MATERIALS; QUASI-MOLECULAR IONS; REFERENCE SIGNALS; SECONDARY ION EMISSION; SECONDARY ION YIELD; SECONDARY IONS; SURFACE ENRICHMENT; THREE DIMENSIONAL IMAGES; TRANSFER OF CHARGES; YIELD ENHANCEMENT; YIELD SUPPRESSION;

IONS;

EID: 70349241675     PISSN: 15206106     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp904911n     Document Type: Article

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