An antireflective silicon grating working in the resonance domain for the near infrared spectral region

Optics Communications

Volumn 226, Issue 1-6, 2003, Pages 81-88

  Escoubas, L ^a   Simon, J J ^a   Loli, M ^a   Berginc, G ^b   Flory, F ^a   Giovannini, H ^a  

^a AIX MARSEILLE UNIVERSITÉ   (France)

^b THALES   (France)

Author keywords

Antireflection surfaces; Diffraction gratings; Effective medium theory; Homogenization theory; Infrared; Modal method; Wet anisotropic etching

Indexed keywords

ETCHING; INFRARED RADIATION; LASERS; OPTICAL RESOLVING POWER; RESONANCE; SILICON;

SILICON GRATINGS;

DIFFRACTION GRATINGS;

EID: 0141928852     PISSN: 00304018     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.optcom.2003.08.034     Document Type: Article

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