A facile process to improve linear birefringence of SiO2 thin films

Journal of Physics D: Applied Physics

Volumn 42, Issue 16, 2009, Pages

  Xiao, Xiudi ^a,b   Dong, Guoping ^a,b   Fan, Zhengxiu ^a   Yi, Ki ^a   He, Hongbo ^a   Shao, Jianda ^a  

^a SHANGHAI INSTITUTE OF OPTICS AND FINE MECHANICS   (China)

^b INSTITUTE OF GEOLOGY AND GEOPHYSICS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

AS-DEPOSITED THIN FILMS; COLUMNAR STRUCTURES; COLUMNAR THIN FILMS; DEPOSITION ANGLE; FIELD EMISSION SCANNING ELECTRON MICROSCOPY; LINEAR BIREFRINGENCE; LOW REFRACTIVE INDEX; POLARIZATION SPLITTINGS; UV-VIS-NIR;

ATOMIC FORCE MICROSCOPY; BIREFRINGENCE; CRYSTALS; FIELD EMISSION; FIELD EMISSION MICROSCOPES; OPTICAL MICROSCOPY; PARTICLE SIZE; PARTICLE SIZE ANALYSIS; PORE SIZE; REFRACTIVE INDEX; SCANNING ELECTRON MICROSCOPY; SILICON COMPOUNDS; SIZE DISTRIBUTION; SOIL MECHANICS; SOLS; VAPOR DEPOSITION; ZIRCONIUM ALLOYS;

THIN FILMS;

EID: 70249109746     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/42/16/165305     Document Type: Article

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