Optical characterization of thermally oxidized Ni films

Journal of Physics D: Applied Physics

Volumn 42, Issue 11, 2009, Pages

  Seo, Y K ^a   Lee, D J ^a   Koh, Y D ^a   Chung, J S ^a   Lee, Y S ^a   Jo, Y ^b  

^a Soongsil University   (South Korea)

^b Korea Basic Science Institute (KBSI)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

MAGNETIC ANALYSIS; MOTT INSULATORS; NI FILMS; NIO FILMS; OPTICAL CHARACTERIZATION; OPTICAL SPECTROSCOPIC TECHNIQUES; OXIDATION DEGREE; SYSTEMATIC CHANGES; THERMALLY OXIDIZED;

ELECTRONIC PROPERTIES; NICKEL; OPTICAL PROPERTIES; SPECTROSCOPIC ANALYSIS;

OPTICAL FILMS;

EID: 70249094314     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/42/11/115407     Document Type: Article

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