Study on laser direct writing system for 32nm node

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7284, Issue , 2009, Pages

  Jiang, Wenbo ^a,b   Hu, Song ^a   Yang, Yong ^a,b   Zhao, Lixin ^a   Yan, Wei ^a   Zhou, Shaolin ^a   Chen, Wangfu ^a  

^a INSTITUTE OF OPTICS AND ELECTRONICS   (China)

^b UNIVERSITY OF CHINESE ACADEMY OF SCIENCES   (China)

Author keywords

Key technique; Laser direct writing system; Optical lithographic experiment; Resolution

Indexed keywords

32-NM NODE; CONVENTIONAL LASERS; FOCUSING SYSTEM; HIGHER RESOLUTION; ILLUMINATING SYSTEMS; KEY TECHNIQUE; KEY TECHNIQUES; LASER DIRECT WRITING SYSTEM; LITHOGRAPHIC TECHNOLOGIES; LOWER COST; OPTICAL LITHOGRAPHIC EXPERIMENT; PHOTON SIEVES; PRECISE POSITION; PROPER DESIGN; RESOLUTION; THEORETIC ANALYSIS; WHOLE SYSTEMS;

LASERS; MANUFACTURE; OPTICAL BEAM SPLITTERS; OPTICAL DESIGN; OPTICAL INSTRUMENTS; TESTING;

EXPERIMENTS;

EID: 69949157415     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.832070     Document Type: Conference Paper

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