A periodic array of silicon pillars fabricated by photoelectrochemical etching

Electrochimica Acta

Volumn 54, Issue 27, 2009, Pages 6978-6982

  Li, Xiaopeng ^a   Seo, Hong Seok ^a   Um, Han Don ^a   Jee, Sang Won ^a   Cho, Yong Woo ^a   Yoo, Bongyoung ^a   Lee, Jung Ho ^a  

^a Hanyang University   (South Korea)

Author keywords

KOH post etching; Macroporous silicon; Photoelectrochemical etching; Pore separation; Silicon pillar array

Indexed keywords

KOH POST-ETCHING; MACROPOROUS SILICON; PHOTOELECTROCHEMICAL ETCHING; PORE SEPARATION; SILICON PILLAR ARRAY;

ANISOTROPY; ASPECT RATIO; FABRICATION; PLANTS (BOTANY); POROUS SILICON; SEMICONDUCTING SILICON COMPOUNDS; SEPARATION; SILICON WAFERS;

ANISOTROPIC ETCHING;

EID: 69949136942     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2009.06.094     Document Type: Article

References (29)

1. Chan Y.C., Lee Y.-K., and Zohar Y. J. Micromech. Microeng. 16 (2006) 699
2. Yi S., Seo K.-S., and Cho Y.-H. Sens. Actuators A 120 (2005) 429
3. Zhu L., Feng Y., Ye X., and Zhou Z. Sens. Actuators A 130 (2005) 595
4. Öner D., and McCarthy T.J. Langmuir 16 (2000) 7777
5. Yoshimitsu Z., Nakajima A., Watanabe T., and Hashimoto K. Langmuir 18 (2002) 5818
6. Maiolo III J.R., Kayes B.M., Filler M.A., Putnam M.C., Kelzenberg M.D., Atwater H.A., and Lewis N.S. J. Am. Chem. Soc. 129 (2007) 12346
7. Min W.-L., Jiang B., and Jiang P. Adv. Mater. 20 (2008) 1
8. Sainiemi L., Keskinen H., Aromaa M., Luosujärvi L., Grigoras K., Kotiaho T., Mäkelä J.M., and Franssila S. Nanotechnology 18 (2007) 505303
9. Morton K.J., Nieberg G., Bai S., and Chou S.Y. Nanotechnology 19 (2008) 345301
10. Mills D., and Kolasinski K.W. J. Phys. D: Appl. Phys. 38 (2005) 632
11. Mills D., Nahidi M., and Kolasinski K.W. Phys. Stat. Sol. (a) 8 (2005) 1422
12. Kayes B.M., Filler M.A., Putnam M.C., Kelzenberg M.D., Lewis N.S., and Atwater H.A. Appl. Phys. Lett. 91 (2007) 103110
13. Lehmann V., and Föll H. J. Electrochem. Soc. 137 (1990) 653
14. Lehmann V. J. Electrochem. Soc. 140 (1993) 2836
15. Kleimann P. Appl. Phys. Lett. 79 (2001) 1727
16. Kleimann P., Badel X., and Linnros J. Appl. Phys. Lett. 86 (2005) 183108
17. Barillaro G., Nannini A., and Pitto M. Sens. Actuators A 102 (2002) 195
18. Canham L.T. Appl. Phys. Lett. 57 (1990) 1046
19. van den Meerakker J.E.A.M., Elfrink R.J.G., Weeda W.M., and Roozeboom F. Phys. Stat. Sol. (a) 197 (2003) 57
20. Lau H.W., Parker G.J., Greef R., and Hölling M. Appl. Phys. Lett. 67 (1995) 1877
21. Trifonov T., Garín M., Rodríguez A., Ortega P., Marsal L.F., and Alcubilla R. Proc. SPIE 6593 (2007) 65931Q-1
22. Lehmann V. Phys. Stat. Sol. (a) 204 (2007) 1318
23. Linnros J., Badel X., and Kleimann P. Phys. Scripta T126 (2006) 72
24. Zhang X.G. J. Electrochem. Soc. 138 (1991) 3750
25. Föll H., Christophersen M., Carstensen J., and Hasse G. Mater. Sci. Eng. R 39 (2000) 93
26. Zhang X.G. J. Electrochem. Soc. 151 (2004) C69
27. Lehmann V. Electrochemistry of Silicon (2002), Wiley-VCH, Weinheim
28. Zubel I., Barycka I., Kotowska K., and Kramkowska M. Sens. Actuators A 87 (2001) 163
29. Seidel H., Cseprege L., Heuberger A., and Baumgarel H. J. Electrochem. Soc. 137 (1990) 3626