Novel ultra-lightweight and high-resolution MEMS X-ray optics

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7360, Issue , 2009, Pages

  Mitsuishi, Ikuyuki ^a   Ezoe, Yuichiro ^b   Takagi, Utako ^b   Mita, Makoto ^a   Riveros, Raul ^c   Yamaguchi, Hitomi ^c   Kato, Fumiki ^d   Sugiyama, Susumu ^d   Fujiwara, Kouzou ^e   Morishita, Kohei ^e   Nakajima, Kazuo ^e   Fujihira, Shinya ^e   Kanamori, Yoshiaki ^e   Yamasaki, Noriko Y ^a   Mitsuda, Kazuhisa ^a   Maeda, Ryutaro ^f  

^a JAPAN AEROSPACE EXPLORATION AGENCY   (Japan)

^b TOKYO METROPOLITAN UNIVERSITY   (Japan)

^c University of Florida   (United States)

^d RITSUMEIKAN UNIVERSITY   (Japan)

^e TOHOKU UNIVERSITY   (Japan)

^f NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

D RIE; Hot plastic deformation; Hydrogen annealing; Magnetic field assisted polishing; MEMS; X ray LIGA

Indexed keywords

ANGULAR RESOLUTION; ANGULAR RESPONSE; ANISOTROPIC WET ETCHING; CRYSTAL PLANES; D-RIE; HIGH RESOLUTION; HOT PLASTIC DEFORMATION; HYDROGEN ANNEAL; HYDROGEN ANNEALING; MAGNETIC FLUID ASSISTED POLISHING; MEMS TECHNOLOGY; MICRO ELECTRO MECHANICAL SYSTEM; MODEL CALCULATIONS; OPTICAL SURFACES; THIN WAFERS; ULTRA-LIGHT; X RAY MIRRORS; X RAY REFLECTION; X RAY TELESCOPE; X-RAY LIGA;

HYDROGEN; LIGHT; LIGHT REFLECTION; MAGNETIC FIELDS; MAGNETIC FLUIDS; MEMS; MICROELECTROMECHANICAL DEVICES; MIRRORS; NICKEL ALLOYS; PHOTORESISTS; PLASMA ETCHING; PLASTIC DEFORMATION; PLASTICS; POLISHING; REFLECTION; SEMICONDUCTING SILICON COMPOUNDS; SURFACE ROUGHNESS; TELESCOPES; ULTRAVIOLET DEVICES; X RAY OPTICS; X RAYS;

SILICON WAFERS;

EID: 69949115915     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.823933     Document Type: Conference Paper

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