Micromachined X-ray collector for space astronomy

Sensors and Actuators, A: Physical

Volumn 145-146, Issue 1-2, 2008, Pages 201-206

  Ezoe, Yuichiro ^a   Koshiishi, Masaki ^a   Mita, Makoto ^a   Maeda, Yoshitomo ^a   Mitsuda, Kazuhisa ^a   Osawa, Takeyuki ^b   Suzuki, Masaki ^b   Hoshino, Akio ^b   Ishisaki, Yoshitaka ^b   Takano, Takayuki ^c   Maeda, Ryutaro ^c  

^a JAPAN AEROSPACE EXPLORATION AGENCY   (Japan)

^b TOKYO METROPOLITAN UNIVERSITY   (Japan)

^c NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Anisotropic wet etching; Deep reactive ion etching; X ray collector

Indexed keywords

ALUMINUM; ASTROPHYSICS; CHEMICAL MODIFICATION; CODES (SYMBOLS); ETCHING; MICROFLUIDICS; MIRRORS; SILICON; SILICON WAFERS; SURFACE ROUGHNESS; ULTRASONICS; WALL FLOW; WALLS (STRUCTURAL PARTITIONS); X RAY ANALYSIS; X RAYS;

(1 1 0) SURFACE; COLLECTOR (FLOTATION); DEEP REACTIVE ION ETCHING (DRIV); ELSEVIER (CO); IN ORDER; MICROMACHINED; POTASSIUM OXIDE (KOH) ETCHING; SIDE WALLS; SPACE ASTRONOMY; X RAY BEAMS; X RAY MIRRORS;

REACTIVE ION ETCHING;

EID: 44849100559     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.sna.2007.12.003     Document Type: Article

References (4)

1. Ezoe Y., Koshiishi M., Mita M., Mitsuda K., Hoshino A., Ishisaki Y., Yang Z., Takano T., and Maeda R. Micropore X-ray optics using anisotropic wet etching of (110) silicon wafers. Appl. Opt. 45 (2006) 8932-8938
2. Koshiishi M., Ezoe Y., Mita M., Mitsuda K., Takano T., Maeda R., and Ishisaki Y. Design and fabrication of a MEMS X-ray optic using anisotropic wet etching of Si wafers. IEEE/LEOS Int. Conf. on Optical MEMS and Their Applications. Montana, USA, August 21-24 (2006)
3. Ezoe Y., Koshiishi M., Mita M., Mitsuda K., Hoshino A., Ishisaki Y., Takano T., and Maeda R. Silicon micro-pore X-ray optics. Nucl. Instr. Meth. A 579 (2007) 817-820
4. Ohwada K., Negoro Y., Konaka Y., and Oguchi T. Uniform groove-depths in (110) Si anisotropic etching by ultrasonic waves and application to accelerometer fabrication. Sens. Actuators A50 (1998) 93-98