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Microsystem Technologies
Volumn 6, Issue 6, 2000, Pages 218-221
High aspect ratio electrostatic micro actuators using LIGA process
Author keywords

[No Author keywords available]
Indexed keywords

EID: 0000773741     PISSN: 09467076     EISSN: None     Source Type: Journal    
DOI: 10.1007/s005420000064     Document Type: Article
Times cited : (20)
References (7)
  • 1
    • 0003245056 scopus 로고
    • The LIGA process - A microfabrication technology
    • Bley P; Mohr J (1994) The LIGA process - a microfabrication technology. FED Journal 5(Suppl. 1): 34-48
    • (1994) FED Journal , vol.5 , Issue.1 SUPPL. , pp. 34-48
    • Bley, P.1    Mohr, J.2
  • 2
    • 0029192163 scopus 로고
    • Piezoelectric composites for micro-ultrasonic transducers realized with deep-etch X-ray lithography
    • Hirata Y; Okuyama H et al. (1995) Piezoelectric composites for micro-ultrasonic transducers realized with deep-etch X-ray lithography. Proc. IEEE MEMS' 95: 191-195
    • (1995) Proc. IEEE MEMS' , vol.95 , pp. 191-195
    • Hirata, Y.1    Okuyama, H.2
  • 4
    • 0041585202 scopus 로고    scopus 로고
    • Electrostatic actuators
    • Suzumori K (1997) Electrostatic actuators. JRSJ 15(3): 342-346
    • (1997) JRSJ , vol.15 , Issue.3 , pp. 342-346
    • Suzumori, K.1
  • 5
    • 0042086240 scopus 로고    scopus 로고
    • A compact SR beamline for fabrication of high aspect ratio MEMS microparts
    • Ueno H; Konishi S; Sugiyama S et al. (1997) A compact SR beamline for fabrication of high aspect ratio MEMS microparts. Proceedings of MHS'97, pp. 49-54
    • (1997) Proceedings of MHS'97 , pp. 49-54
    • Ueno, H.1    Konishi, S.2    Sugiyama, S.3
  • 6
    • 0007379732 scopus 로고
    • ohm-sha, in Japanese
    • The Institute of Electrostatics Japan (1981) Handbook of Electrostatics, ohm-sha, pp. 212-215 (in Japanese)
    • (1981) Handbook of Electrostatics , pp. 212-215
  • 7
    • 0003180296 scopus 로고    scopus 로고
    • An X-ray mask with a low-stress controlled polysilicon membrane in use for high aspect ratio pattern lithography
    • Suzuki K; Nakamura H; Ueno H; Sugiyama S (1997) An X-ray mask with a low-stress controlled polysilicon membrane in use for high aspect ratio pattern lithography. Technical Digest of the 15th Sensor Symposium, pp. 197-200
    • (1997) Technical Digest of the 15th Sensor Symposium , pp. 197-200
    • Suzuki, K.1    Nakamura, H.2    Ueno, H.3    Sugiyama, S.4

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.