Magnetic field assisted finishing of ultra-lightweight and high-resolution MEMS x-ray micro-pore optics

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7360, Issue , 2009, Pages

  Riveros, Raul E ^a   Yamaguchi, Hitomi ^a   Mitsuishi, Ikuyuki ^b   Takagi, Utako ^c   Ezoe, Yuichiro ^c   Kato, Fumiki ^d   Sugiyama, Susumu ^d   Yamasaki, Noriko ^b   Mitsuda, Kazuhisa ^b  

^a UNIVERSITY OF FLORIDA   (United States)

^b JAPAN AEROSPACE EXPLORATION AGENCY   (Japan)

^c TOKYO METROPOLITAN UNIVERSITY   (Japan)

^d RITSUMEIKAN UNIVERSITY   (Japan)

Author keywords

DRIE; LIGA; Magnetic field assisted finishing; Micropore optics; Polishing; X ray

Indexed keywords

ALTERNATING MAGNETIC FIELD; ANGULAR RESOLUTION; ANISOTROPIC WET ETCHING; DRIE; EFFECTIVE AREA; FINISHING PROCESS; FLAT CRYSTALS; HIGH RESOLUTION; LIGA; MEMS TECHNOLOGY; MICROPORE OPTICS; MICROPORES; POLISHING PROCESSS; PORE OPTICS; PROCESSING PRINCIPLES; REFLECTING SURFACE; ULTRA-PRECISION POLISHING; X RAY REFLECTION; X RAY TELESCOPE;

MAGNETIC FIELDS; MEMS; MICROELECTROMECHANICAL DEVICES; MICROPOROSITY; OPTICAL INSTRUMENTS; OPTICAL TELESCOPES; PHOTORESISTS; PLASMA ETCHING; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS; SPACE FLIGHT; SPACECRAFT OBSERVATORIES; SURFACE ROUGHNESS; TELESCOPES; ULTRAVIOLET DEVICES; X RAY OPTICS; X RAYS;

POLISHING;

EID: 69949129768     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.823961     Document Type: Conference Paper

References (10)

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