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Volumn 483, Issue 1-2, 2009, Pages 402-405

A comparative study of the electrochemical deposition of molybdenum oxides thin films on copper and platinum

Author keywords

Atomic Force Microscopy AFM; Electrochemical reactions; Thin films

Indexed keywords

AFM IMAGE; AG/AGCL; AMMONIUM MOLYBDATE; AS-DEPOSITED THIN FILMS; COMPARATIVE STUDIES; CONSTANT POTENTIAL; ELECTROCHEMICAL DEPOSITION; ELECTROCHEMICAL REACTIONS; GRANULAR MORPHOLOGY; MOLYBDENUM OXIDES; PHASE PRESENT; SMOOTH COPPER; XRD; XRD SPECTRA;

EID: 69249244321     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2008.08.119     Document Type: Article
Times cited : (14)

References (17)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.