SCOPUS 정보 검색 플랫폼

Vakuum in Forschung und Praxis

Volumn 21, Issue 4, 2009, Pages 24-30

Magnetron sputter-deposition on atom layer scale

(1) Scherer, Michael a

a Leybold Optics GmbH (Georgia)

Author keywords

[No Author keywords available]

Indexed keywords

COSPUTTERING; DEPOSITION PROCESS; ENERGY INPUTS; FILM STRESS; HIGH DEPOSITION RATES; HIGH SPEED DRIVES; IN-SITU; INTERFERENCE FILTERS; LAYER DEPOSITION; LAYER SCALE; MAGNETRON SPUTTER; MIXED OXIDE; OPTICAL APPLICATIONS; OPTICAL THICKNESS; OXYGEN PARTIAL PRESSURE; PLASMA ASSISTED REACTIVE MAGNETRON SPUTTERING; SINGLE LAYER; SUBSTRATE TEMPERATURE; TIME CONTROL;

ATOMS; FLUORESCENCE MICROSCOPY; LIGHT TRANSMISSION; MAGNETRONS; OPTICAL MICROSCOPY; ORGANIC POLYMERS; OXYGEN; REFRACTIVE INDEX; SUBSTRATES; SURFACE ROUGHNESS; THICKNESS CONTROL;

PROCESS CONTROL;

EID: 69049087174 PISSN: 0947076X EISSN: None Source Type: Journal
DOI: 10.1002/vipr.200900391 Document Type: Article

Times cited : (14)

References (8)

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2
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3
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- May 1
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5
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.