Computer simulation of coating processes with monochromatic monitoring

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7101, Issue , 2008, Pages

  Zoller A ^a   Boos, M ^a   Hagedorn, H ^a   Romanov, B ^a  

^a Leybold Optics GmbH   (Germany)

Author keywords

Computer simulation; Intermittent monitoring; Magnetron sputtering; Optical coatings; Optical monitoring; Plasma IAD; Virtual deposition

Indexed keywords

COATINGS; COMPUTATIONAL METHODS; COMPUTER SIMULATION; FILM PREPARATION; MAGNETRON SPUTTERING; MEASUREMENT ERRORS; MONITORING; MONOCHROMATORS; MULTILAYERS; OPTICAL COATINGS; OPTICAL MULTILAYERS; OPTICAL PROPERTIES; PLASMA DEPOSITION; PLASMA STABILITY; RANDOM ERRORS; REFRACTIVE INDEX; SIGNAL PROCESSING; SYSTEMATIC ERRORS; THICK FILMS; THIN FILMS; WAVE FILTERS;

A STABLES; COATING PROCESSES; COMPLEX TASKS; FILTER DESIGNS; INTERMITTENT MONITORING; MEASUREMENT FREQUENCIES; MONITORING STRATEGIES; MULTILAYER SYSTEMS; NUMBER OF LAYERS; OPTICAL MONITORING; PROCESS INSTABILITIES; ROTATING SUBSTRATES; SIGNAL NOISES; SIMULATION RESULTS; SINGLE NOTCHES; SOFTWARE TOOLS; TIME CONSUMING; TRIAL AND ERRORS; VIRTUAL DEPOSITION;

PROCESS ENGINEERING;

EID: 56249117734     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.797612     Document Type: Conference Paper

References (7)

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