SCOPUS 정보 검색 플랫폼

Volumn 255, Issue 22, 2009, Pages 9058-9061

Effects of flow ratios on surface morphology and structure of hydrogenated amorphous carbon films prepared by microwave plasma chemical vapor deposition

(4) Yang, S B a Pan, F M a Yang, Y E a Zhang, W C a

a NANJING UNIVERSITY OF AERONAUTICS AND ASTRONAUTICS (China)

Author keywords

Atomic force microscopy; Hydrogenated amorphous carbon films; Microwave plasma chemical vapor deposition; Raman spectroscopy

Indexed keywords

ACETYLENE; AMORPHOUS CARBON; AMORPHOUS FILMS; AMORPHOUS SILICON; ATOMIC FORCE MICROSCOPY; CHEMICAL BONDS; DEPOSITION RATES; DIAMOND FILMS; HYDROGEN; HYDROGENATION; LIGHTING; MICROWAVES; MORPHOLOGY; PLASMA CVD; RAMAN SPECTROSCOPY; SURFACE MORPHOLOGY;

BONDING CONFIGURATIONS; HYDROGEN CONTENTS; HYDROGENATED AMORPHOUS CARBON (A-C:H); HYDROGENATED AMORPHOUS CARBON FILMS; MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITIONS; MORPHOLOGY AND STRUCTURES; SILICON SUBSTRATES; SURFACE ENHANCED RAMAN SPECTROSCOPY;

CARBON FILMS;

EID: 68649107833 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/j.apsusc.2009.06.111 Document Type: Article

Times cited : (6)

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