SCOPUS 정보 검색 플랫폼

Volumn 517, Issue 23, 2009, Pages 6298-6300

High density plasma treatment of polyimide substrate to improve structural and electrical properties of Ga-doped ZnO films

(8) Kwon, S I a Lee, S J a Jung, T H a Park, S B a Park, J H a Song, W C a Kang, I N b Lim, D G a

a Chungju National University (South Korea)

b The Catholic University of Korea (South Korea)

Author keywords

Plasma processing; Polyimide substrate; Sputtering; Zinc Oxide

Indexed keywords

GA-DOPED ZNO; HIGH DENSITY; HIGH DENSITY PLASMAS; HIGHLY DENSE; INDUCTIVELY-COUPLED; OPTICAL TRANSMITTANCE; OXYGEN PLASMAS; PLASMA PRE-TREATMENT; PLASMA PROCESSING; PLASMA TREATMENT; POLYIMIDE SUBSTRATE; RF-MAGNETRON SPUTTERING; STRUCTURAL AND ELECTRICAL PROPERTIES; SUBSTRATE HEATING; ZNO;

ELECTRIC PROPERTIES; FILM GROWTH; GALLIUM; GALLIUM ALLOYS; MAGNETRON SPUTTERING; OXYGEN; PLASMA APPLICATIONS; PLASMA DEVICES; POLYIMIDES; SEMICONDUCTING ZINC COMPOUNDS; SUBSTRATES; ZINC; ZINC OXIDE;

PLASMAS;

EID: 68449089662 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2009.02.112 Document Type: Article

Times cited : (10)

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