Influence of positive substrate bias on the electrical properties of zno:Al films prepared by DC magnetron sputtering

Journal of the Korean Physical Society

Volumn 50, Issue 6, 2007, Pages 1697-1700

  Lim, D G ^a   Kang, G S ^a   Kwon, S I ^a   Park, M W ^b   Kwak, D J ^b  

^a Chungju National University   (South Korea)

^b Kyungsung University   (South Korea)

Author keywords

DC magnetron sputtering; Substrate bias voltage; Zno:Al film

Indexed keywords

EID: 34547263550     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: 10.3938/jkps.50.1697     Document Type: Article

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