Simulation of kinetically limited growth of electrodeposited polycrystalline Ni films

Physica E: Low-Dimensional Systems and Nanostructures

Volumn 41, Issue 9, 2009, Pages 1673-1678

  Huang, Y Y ^a   Zhou, Y C ^a   Pan, Y ^a  

^a XIANGTAN UNIVERSITY   (China)

Author keywords

Electrodeposition; Growth; Kinetic Monte Carlo simulations; Nickel; Polycrystalline thin films

Indexed keywords

DEPOSITION PARAMETERS; ELECTROLYTE TEMPERATURE; ELEVATED TEMPERATURE; ENERGY ANISOTROPY; GROWTH; GROWTH DYNAMICS; GROWTH EXPONENT; HYDROGEN ABSORPTION; KINETIC MONTE CARLO; KINETIC MONTE CARLO SIMULATIONS; MICROSTRUCTURE EVOLUTIONS; NI FILMS; NI THIN FILMS; PLATED FILMS; POLYCRYSTALLINE; POLYCRYSTALLINE THIN FILMS; PREFERENTIAL ORIENTATION; SCALING BEHAVIOR; SHAPE AND SIZE; SURFACE ENERGIES; TRIANGLE LATTICE; WORK FOCUS;

COMPUTER SIMULATION LANGUAGES; CORROSION; DEPOSITION RATES; ELECTRODEPOSITION; HYDROGEN; MONTE CARLO METHODS; NICKEL; NICKEL ALLOYS; OPTICAL RESOLVING POWER; RADIATION DAMAGE; SURFACE CHEMISTRY; SURFACE DIFFUSION; SURFACE RECONSTRUCTION; SURFACE ROUGHNESS; SURFACE TENSION; TEXTURES; THIN FILMS; TWO DIMENSIONAL;

FILM GROWTH;

EID: 68349144584     PISSN: 13869477     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.physe.2009.06.001     Document Type: Article

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