Dry etching of germanium by using Inductively coupled CF 4 plasma

Journal of the Korean Physical Society

Volumn 54, Issue 6, 2009, Pages 2290-2296

  Kim, T S ^a   Yang, H Y ^a   Kil, Y H ^a   Jeong, T S ^a   Kang, S ^a   Shim, K H ^a  

^a Chonbuk National University   (South Korea)

Author keywords

Etching; Ge; ICP; Plasma

Indexed keywords

EID: 68149171663     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: 10.3938/jkps.54.2290     Document Type: Article

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