메뉴 건너뛰기




Volumn 19, Issue 7, 2009, Pages

Iridium oxide deposited by pulsed dc-sputtering for stimulation electrodes

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION CYCLES; ELECTROCHEMICAL ANALYSIS; IRIDIUM OXIDES; OXYGEN FLOW; PULSE FREQUENCIES; PULSED DC; PULSEWIDTH; PULSING FREQUENCIES; SPUTTERED FILMS; STIMULATION ELECTRODES; THIN-FILM DEPOSITIONS; WORKING PRESSURES;

EID: 67849104759     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/19/7/074009     Document Type: Article
Times cited : (12)

References (20)
  • 1
    • 67849086853 scopus 로고    scopus 로고
    • Microsystem technologies for an epiretinal implant
    • Mokwa W 2006 Microsystem technologies for an epiretinal implant Biomed. Pharmacother. 60 475-6
    • (2006) Biomed. Pharmacother. , vol.60 , pp. 475-476
    • Mokwa, W.1
  • 2
    • 0032258808 scopus 로고    scopus 로고
    • A microstructure for interfacing with neurons: The neurochip
    • IEEE Engineering in Medicine and Biology Society
    • Maher M, Wright J, Pine J and Yu-Chong T 1998 A microstructure for interfacing with neurons: the neurochip Proc. 20th Ann. Int. Conf. IEEE Engineering in Medicine and Biology Society 20 1698-702
    • (1998) Proc. 20th Ann. Int. Conf. , vol.20 , pp. 1698-1702
    • Maher, M.1    Wright, J.2    Pine, J.3    Yu-Chong, T.4
  • 3
    • 3242725305 scopus 로고    scopus 로고
    • Sputtered iridium oxide films as charge injection material for functional electrostimulation
    • Slavcheva E, Vitushinsky R, Mokwa W and Schnakenberg U 2004 Sputtered iridium oxide films as charge injection material for functional electrostimulation J. Electrochem. Soc. 151 E226-37
    • (2004) J. Electrochem. Soc. , vol.151
    • Slavcheva, E.1    Vitushinsky, R.2    Mokwa, W.3    Schnakenberg, U.4
  • 4
    • 84948600170 scopus 로고
    • Activated Ir-an electrode suitable for reversible charge injection in saline solution
    • Robblee L S, Lefko J L and Brummer S B 1983 Activated Ir-an electrode suitable for reversible charge injection in saline solution J. Electrochem. Soc. 130 731-3
    • (1983) J. Electrochem. Soc. , vol.130 , pp. 731-733
    • Robblee, L.S.1    Lefko, J.L.2    Brummer, S.B.3
  • 6
    • 34047191848 scopus 로고    scopus 로고
    • Reactively sputtered iridium oxide-influence of plasma excitation and substrate temperature on morphology, composition, and electrochemical characteristics
    • Wessling B, Besmehn A, Mokwa W and Schnakenberg U 2007 Reactively sputtered iridium oxide-influence of plasma excitation and substrate temperature on morphology, composition, and electrochemical characteristics J. Electrochem. Soc. 154 F83-9
    • (2007) J. Electrochem. Soc. , vol.154
    • Wessling, B.1    Besmehn, A.2    Mokwa, W.3    Schnakenberg, U.4
  • 9
    • 33646741435 scopus 로고    scopus 로고
    • RF-sputtering of iridium oxide to be used as stimulation material in functional medical implants
    • Wessling B, Mokwa W and Schnakenberg U 2006 RF-sputtering of iridium oxide to be used as stimulation material in functional medical implants J. Micromech. Microeng. 16 S142-8
    • (2006) J. Micromech. Microeng. , vol.16
    • Wessling, B.1    Mokwa, W.2    Schnakenberg, U.3
  • 10
    • 0034262486 scopus 로고    scopus 로고
    • Formation process and material properties of reactive sputtered IrO2 thin films
    • Horng R H, Wuu D S, Wu L H and Lee M K 2000 Formation process and material properties of reactive sputtered IrO2 thin films Thin Solid Films 373 231-4
    • (2000) Thin Solid Films , vol.373 , pp. 231-234
    • Horng, R.H.1    Wuu, D.S.2    Wu, L.H.3    Lee, M.K.4
  • 11
    • 0004449634 scopus 로고
    • Morphology and charge capacity of sputtered iridium oxide-films
    • Klein J D, Clauson S L and Cogan S F 1989 Morphology and charge capacity of sputtered iridium oxide-films J. Vac. Sci. Technol. 7 3043-7
    • (1989) J. Vac. Sci. Technol. , vol.7 , pp. 3043-3047
    • Klein, J.D.1    Clauson, S.L.2    Cogan, S.F.3
  • 12
    • 0033703601 scopus 로고    scopus 로고
    • Recent aspects concerning DC reactive magnetron sputtering of thin films: A review
    • Safi I 2000 Recent aspects concerning DC reactive magnetron sputtering of thin films: a review Surf. Coat. Technol. 127 203-19
    • (2000) Surf. Coat. Technol. , vol.127 , pp. 203-219
    • Safi, I.1
  • 13
    • 0035440735 scopus 로고    scopus 로고
    • Preparation and properties of DC-sputtered IrO2 and Ir thin films for oxygen barrier applications in advanced memory technology
    • B
    • Pinnow C U, Kasko I, Dehm C, Jobst B, Seibt M and Geyer U 2001 Preparation and properties of dc-sputtered IrO2 and Ir thin films for oxygen barrier applications in advanced memory technology J. Vac. Sci. Technol. B 19 1857-65
    • (2001) J. Vac. Sci. Technol. , vol.19 , pp. 1857-1865
    • Pinnow, C.U.1    Kasko, I.2    Dehm, C.3    Jobst, B.4    Seibt, M.5    Geyer, U.6
  • 14
    • 0033885349 scopus 로고    scopus 로고
    • Frequency response in pulsed DC reactive sputtering processes
    • DOI 10.1016/S0040-6090(99)01116-5
    • Jonsson L B, Nyberg T, Katardjiev I and Berg S 2000 Frequency response in pulsed DC reactive sputtering processes Thin Solid Films 365 43-8 (Pubitemid 30587704)
    • (2000) Thin Solid Films , vol.365 , Issue.1 , pp. 43-48
    • Jonsson, L.B.1    Nyberg, T.2    Katardjiev, I.3    Berg, S.4
  • 15
    • 34248998115 scopus 로고    scopus 로고
    • Characterization of iridium oxide thin films deposited by pulsed-direct-current reactive sputtering
    • Thanawala S, Georgiev D G, Baird R J and Auner G 2007 Characterization of iridium oxide thin films deposited by pulsed-direct-current reactive sputtering Thin Solid Films 515 7059-65
    • (2007) Thin Solid Films , vol.515 , pp. 7059-7065
    • Thanawala, S.1    Georgiev, D.G.2    Baird, R.J.3    Auner, G.4
  • 16
    • 0025664322 scopus 로고
    • Time-dependent simulation modelling of reactivesputtering
    • Kusano E and Goulart D M 1990 Time-dependent simulation modelling of reactivesputtering Thin Solid Films 193 84-91
    • (1990) Thin Solid Films , vol.193 , pp. 84-91
    • Kusano, E.1    Goulart, D.M.2
  • 19
    • 0024027087 scopus 로고
    • Charge injection limits of activated iridium oxide electrodes with 0.2 ms pulses in bicarbonate buffered saline [neurological stimulation application]
    • Beebe X and Rose T L 1988 Charge injection limits of activated iridium oxide electrodes with 0.2 ms pulses in bicarbonate buffered saline [neurological stimulation application] Biomed. Eng. IEEE Trans. 35 494-5
    • (1988) Biomed. Eng. IEEE Trans. , vol.35 , pp. 494-495
    • Beebe, X.1    Rose, T.L.2
  • 20
    • 0036127166 scopus 로고    scopus 로고
    • Characterization of iridium film as a stimulating neural electrode
    • Lee I S, Whang C N, Choi K, Choo M S and Lee Y H 2002 Characterization of iridium film as a stimulating neural electrode Biomaterials 23 2375-80
    • (2002) Biomaterials , vol.23 , pp. 2375-2380
    • Lee, I.S.1    Whang, C.N.2    Choi, K.3    Choo, M.S.4    Lee, Y.H.5


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.