Characterization of iridium oxide thin films deposited by pulsed-direct-current reactive sputtering

Thin Solid Films

Volumn 515, Issue 18, 2007, Pages 7059-7065

  Thanawala, Sachin ^a   Georgiev, Daniel G ^a,b   Baird, Ronald J ^a   Auner, Gregory ^a  

^a Wayne State University   (United States)

^b The University of Toledo   (United States)

Author keywords

Iridium oxide; Pulsed DC reactive sputtering; RBS; XPS

Indexed keywords

BOROSILICATE GLASS; DEPOSITION; IRIDIUM COMPOUNDS; REACTIVE SPUTTERING; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

FILM DEPOSITION; IRIDIUM METALS; IRIDIUM OXIDE; SPUTTERED FILMS;

THIN FILMS;

EID: 34248998115     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.02.090     Document Type: Article

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