Work function for applications - How work function is determined, modified and applied for band alignment-

IEEJ Transactions on Electronics, Information and Systems

Volumn 129, Issue 6, 2009, Pages

  Yoshitake, Michiko ^a   Yagyu, Shinjiro ^a  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

Author keywords

Band alignment; Fermi level; Interface modification; Schottky barrier; Work function

Indexed keywords

ADSORPTION; ALIGNMENT; ELECTRONIC STATES; FERMI LEVEL; FERMIONS; PHASE DIAGRAMS; PHASE INTERFACES; SCHOTTKY BARRIER DIODES; SURFACE SEGREGATION; SURFACES; VACUUM; VACUUM APPLICATIONS;

BAND ALIGNMENT; BAND ALIGNMENTS; BULK MATERIALS; ELECTRONIC POTENTIALS; INTERFACE MODIFICATION; SCHOTTKY BARRIER; SCHOTTKY BARRIER HEIGHTS; SOLID-VACUUM INTERFACES; SURFACE MODIFICATION; SURFACE TERMINATION;

WORK FUNCTION;

EID: 67651177477     PISSN: 03854221     EISSN: 13488155     Source Type: Journal    
DOI: None     Document Type: Article

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