NIL mold manufacturing using self-organized diblock copolymer as patterning template

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6921, Issue , 2008, Pages

  Kihara, Naoko ^a   Hieda, Hiroyuki ^a   Naito, Katsuyuki ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

Diblock copolymer; Nanoimprint; Patterned media; Self organization

Indexed keywords

CHEMICAL DAMAGES; DIBLOCK COPOLYMER; DIBLOCK COPOLYMER TEMPLATES; ION MILLING; LOW COST FABRICATION; MAGNETIC DOT ARRAYS; MEMORY DENSITY; MOLD MANUFACTURING; NANO-IMPRINT; NANO-IMPRINTING; PATTERNED MEDIAS; PATTERNING PROCESS; POSSIBLE SOLUTIONS; PRACTICAL METHOD; ROOM TEMPERATURE; SELF-ORGANIZATIONS; SELF-ORGANIZED; SI SUBSTRATES;

ASPECT RATIO; BLOCK COPOLYMERS; COPOLYMERIZATION; ELECTROFORMING; MANUFACTURE; MOLDS;

NANOIMPRINT LITHOGRAPHY;

EID: 67650908622     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.771630     Document Type: Conference Paper

References (16)

1. H. J. Richter, A.Y. Dobin, O. Heinonen, K.Z. Gao, R. J. M. v. d. Veedonk, R. T. Lynch, J. Xue, D. Weller, P. Asselin, M. F. Erden, R. M. Brockie, IEEE Trans. Mag. 42, 2255 (2006).
2. B.D. Terris, T. Thomson, J. Phys. D: Appl. Phys. 38, R199 (2005).
3. K. Naito, H. Hieda, M. Sakurai, Y. Kamata, K. Asakawa, IEEE Trans. Mag. 38, 1949 (2002).
4. S. Hosaka, H. Sano, M. Shirai, H. Sone, Appl. Phys. Lett. 89, 223131 (2006).
5. S. Hosaka, H. Sano, M. Shirai, Y. Yin, H. Sone, Microelectron. Eng. 84, 802 (2007).
6. H. Oshima, H. Kikuchi, H. Nakao, T. Kamimura, T. Morikawa, K. Matsumoto, J. Yuan, S. Ishio, K. Nishio, H. Masuda, K. Itoh, IEEE trans. Mag. 43, 2148 (2002).
7. J. Y. Cheng, C. A. Ross, H. I. Smith, E.L. Thomas, Adv. Mater., 18, 2505 (2006).
8. C. T. Black, R. Ruiz, Proc. SPIE 6153, 1 (2006).
9. L. Soundstom, L. Krupp, E. Delenia, C, Rettner, M. Sanchez, M. W. Hart, H-C. Kim, Appl. Phys. Lett. 88, 243107 (2007).
10. K. Asakawa, T. Hiraoka, Jap. J. Appl. Phys. 41, 6112 (2002).
11. D. H. Kim, X. Jia, Z. Lin, K. W. Guarini, T. Russell, Adv. Mater. 16, 702 (2004).
12. H. Hieda, Y. Yanagita, A. Kikitsu, T. Maeda, K. Naito, J. Photopolym. Sci. Thechnol. 19, 245 (2006).
13. Y. Kamata, A. Kikitsu, H. Hieda, M. Sakurai, K. Naito, Jap. J. Appl. Phys. 95, 6705 (2004).
14. T. Bailey, B. Smith, B. J. Choi, M. Colburn, M. Meissl, S. V. Sreenivasan, J. G. Ekerdt, C. G. Willson, J. Vac. Sci. Technol. B 19, 2806 (2001).
15. M. ColburnJ, B. J. Choi, M. Amistoso, T. Bailey, S. V. Sreenivasan, J. G. Ekerdt, C. G. Willson, J.Vac. Sci. Technol. B 19, 2162 (2001).
16. S. Matsui, Y. Igaku, H. Ishigaki, J. Vac. Sci. Technol. B 19, 2801 (2001).