X-ray photoelectron spectroscopy analysis of organic materials etched by charged water droplet impact

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 27, Issue 4, 2009, Pages 743-747

  Sakai, Yuji ^a,b   Iijima, Yoshitoki ^c   Takaishi, Riou ^a   Asakawa, Daiki ^a   Hiraoka, Kenzo ^a  

^a UNIVERSITY OF YAMANASHI   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

^c JEOL LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROSPRAY DROPLETS; ETCHED SURFACE; IRRADIATION TIME; MATRIX; ORGANIC MATERIALS; SURFACE ETCHING; WATER DROPLETS; XPS SPECTRA;

ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; DROP FORMATION; ETCHING; IRRADIATION; PHOTOELECTRICITY; PHOTOIONIZATION; PHOTONS; POLYSTYRENES; SECONDARY ION MASS SPECTROMETRY; SURFACE ANALYSIS; SURFACE CHEMISTRY; SURFACES; WATER ANALYSIS;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 67650337578     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3077283     Document Type: Article

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