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Volumn 37, Issue 6 PART 1, 2009, Pages 816-822

Microwave-frequency effects on microplasma

Author keywords

Microplasma; Microwave plasma; Plasma impedance; Plasma simulation

Indexed keywords

1.8 GHZ; 900 MHZ; BULK PLASMA; CAPACITIVELY COUPLED; DRIVING FREQUENCIES; ELECTRICAL IMPEDANCE; ELECTRODE VOLTAGE; ELECTRON DENSITIES; EXCITATION FREQUENCY; FREE ELECTRON; FUNCTION OF FREQUENCY; HIGHER FREQUENCIES; ION KINETIC ENERGY; MICRO-PLASMAS; MICROPLASMA; MICROWAVE PLASMA; MICROWAVE POWER; PLASMA IMPEDANCE; PLASMA POTENTIAL; POWER REFLECTION COEFFICIENT; REACTIVE IMPEDANCE; TWO PARAMETER;

EID: 67650334393     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/TPS.2009.2015453     Document Type: Article
Times cited : (47)

References (18)
  • 1
    • 18744362488 scopus 로고    scopus 로고
    • Split-ring resonator microplasma: Microwave model, plasma impedance and power efficiency
    • May
    • F. Iza and J. Hopwood, "Split-ring resonator microplasma: Microwave model, plasma impedance and power efficiency," Plasma Sources Sci. Technol., vol. 14, no. 2, pp. 397-406, May 2005.
    • (2005) Plasma Sources Sci. Technol , vol.14 , Issue.2 , pp. 397-406
    • Iza, F.1    Hopwood, J.2
  • 2
    • 3242807458 scopus 로고    scopus 로고
    • Microplasmas for chemical analysis: Analytical tools or research toys?
    • Jul
    • V. Karanassios, "Microplasmas for chemical analysis: Analytical tools or research toys?" Spectrochim. Acta B, At. Spectrosc., vol. 59, no. 7, pp. 909-928, Jul. 2004.
    • (2004) Spectrochim. Acta B, At. Spectrosc , vol.59 , Issue.7 , pp. 909-928
    • Karanassios, V.1
  • 3
    • 34648833785 scopus 로고    scopus 로고
    • Microplasma synthesis of metal nanoparticles for gas-phase studies of catalyzed carbon nanotube growth
    • Sep
    • W.-H. Chiang and R. M. Sankaran, "Microplasma synthesis of metal nanoparticles for gas-phase studies of catalyzed carbon nanotube growth," Appl. Phys. Lett., vol. 91, no. 12, p. 121 503, Sep. 2007.
    • (2007) Appl. Phys. Lett , vol.91 , Issue.12 , pp. 121-503
    • Chiang, W.-H.1    Sankaran, R.M.2
  • 4
    • 35348958022 scopus 로고    scopus 로고
    • Microplasma trapping of particles
    • Oct
    • J. Xue and J. Hopwood, "Microplasma trapping of particles," IEEE Trans. Plasma Sci., vol. 35, no. 5, pt. 2, pp. 1574-1579, Oct. 2007.
    • (2007) IEEE Trans. Plasma Sci , vol.35 , Issue.5 PART. 2 , pp. 1574-1579
    • Xue, J.1    Hopwood, J.2
  • 5
    • 21044433741 scopus 로고    scopus 로고
    • Spatially resolved diagnostics of an atmospheric pressure direct current helium microplasma
    • May
    • Q. Wang, I. Koleva, V. M. Donnelly, and D. J. Economou, "Spatially resolved diagnostics of an atmospheric pressure direct current helium microplasma," J. Phys. D, Appl. Phys., vol. 38, no. 11, pp. 1690-1697, May 2005.
    • (2005) J. Phys. D, Appl. Phys , vol.38 , Issue.11 , pp. 1690-1697
    • Wang, Q.1    Koleva, I.2    Donnelly, V.M.3    Economou, D.J.4
  • 6
    • 17944375683 scopus 로고    scopus 로고
    • 40000 pixel arrays of ac-excited silicon microcavity plasma devices
    • Mar
    • S.-J. Park, K.-F. Chen, N. P. Ostrom, and J. G. Eden, "40000 pixel arrays of ac-excited silicon microcavity plasma devices," Appl. Phys. Lett., vol. 86, no. 11, p. 111 501, Mar. 2005.
    • (2005) Appl. Phys. Lett , vol.86 , Issue.11 , pp. 111-501
    • Park, S.-J.1    Chen, K.-F.2    Ostrom, N.P.3    Eden, J.G.4
  • 7
    • 0041877363 scopus 로고    scopus 로고
    • Radio-frequency-driven near atmospheric pressure microplasma in a hollow slot electrode configuration
    • Aug
    • Z. Yu, K. Hoshimiya, J. D. Williams, S. F. Polvinen, and G. J. Collins, "Radio-frequency-driven near atmospheric pressure microplasma in a hollow slot electrode configuration," Appl. Phys. Lett., vol. 83, no. 5, pp. 854-856, Aug. 2003.
    • (2003) Appl. Phys. Lett , vol.83 , Issue.5 , pp. 854-856
    • Yu, Z.1    Hoshimiya, K.2    Williams, J.D.3    Polvinen, S.F.4    Collins, G.J.5
  • 8
    • 0036860831 scopus 로고    scopus 로고
    • Plasma needle: A non-destructive atmospheric plasma source for fine surface treatment of (bio)materials
    • Aug
    • E. Stoffels, A. J. Flikweert, W. W. Stoffels, and G. M. W. Kroesen, "Plasma needle: A non-destructive atmospheric plasma source for fine surface treatment of (bio)materials," Plasma Sources Sci. Technol. vol. 11, no. 4, pp. 383-388, Aug. 2002.
    • (2002) Plasma Sources Sci. Technol , vol.11 , Issue.4 , pp. 383-388
    • Stoffels, E.1    Flikweert, A.J.2    Stoffels, W.W.3    Kroesen, G.M.W.4
  • 9
    • 0042929491 scopus 로고    scopus 로고
    • Low-power microwave plasma source based on a microstrip split-ring resonator
    • Aug
    • F. Iza and J. Hopwood, "Low-power microwave plasma source based on a microstrip split-ring resonator," IEEE Trans. Plasma Sci., vol. 31, no. 4, pt. 2, pp. 782-787, Aug. 2003.
    • (2003) IEEE Trans. Plasma Sci , vol.31 , Issue.4 PART. 2 , pp. 782-787
    • Iza, F.1    Hopwood, J.2
  • 11
    • 36449004174 scopus 로고
    • Capacitively coupled glow discharges at frequencies above 13.56 MHz
    • Oct
    • M. Surendra and D. B. Graves, "Capacitively coupled glow discharges at frequencies above 13.56 MHz," Appl. Phys. Lett., vol. 59, no. 17, pp. 2091-2093, Oct. 1991.
    • (1991) Appl. Phys. Lett , vol.59 , Issue.17 , pp. 2091-2093
    • Surendra, M.1    Graves, D.B.2
  • 12
    • 0001456356 scopus 로고
    • Ion flux and ion power losses at the electrode sheaths in a symmetrical RF discharge
    • Mar
    • V. A. Godyak, R. B. Piejak, and B. M. Alexandrovich, "Ion flux and ion power losses at the electrode sheaths in a symmetrical RF discharge," J. Appl. Phys., vol. 69, no. 6, pp. 3455-3460, Mar. 1991.
    • (1991) J. Appl. Phys , vol.69 , Issue.6 , pp. 3455-3460
    • Godyak, V.A.1    Piejak, R.B.2    Alexandrovich, B.M.3
  • 13
    • 34249004684 scopus 로고    scopus 로고
    • Measured radial dependence of the peak sheath voltages present in very high frequency capacitive discharges
    • May
    • E. V. Barnat, P. A. Miller, G. A. Hebner, A. M. Paterson, T. Panagopoulos, E. Hammond, and J. P. Holland, "Measured radial dependence of the peak sheath voltages present in very high frequency capacitive discharges," Appl. Phys. Lett., vol. 90, no. 20, p. 201 503, May 2007.
    • (2007) Appl. Phys. Lett , vol.90 , Issue.20 , pp. 201-503
    • Barnat, E.V.1    Miller, P.A.2    Hebner, G.A.3    Paterson, A.M.4    Panagopoulos, T.5    Hammond, E.6    Holland, J.P.7
  • 14
    • 33750586214 scopus 로고    scopus 로고
    • Frequency dependent plasma characteristics in a capacitively coupled 300 mm wafer plasma processing chamber
    • Oct
    • G. A. Hebner, E. V. Barnat, P. A. Miller, A. M. Paterson, and J. P. Holland, "Frequency dependent plasma characteristics in a capacitively coupled 300 mm wafer plasma processing chamber," Plasma Sources Sci. Technol., vol. 15, no. 4, pp. 879-888, Oct. 2006.
    • (2006) Plasma Sources Sci. Technol , vol.15 , Issue.4 , pp. 879-888
    • Hebner, G.A.1    Barnat, E.V.2    Miller, P.A.3    Paterson, A.M.4    Holland, J.P.5
  • 15
    • 0026137242 scopus 로고
    • Particle simulations of radio-frequency glow discharges
    • Apr
    • M. Surendra and D. B. Graves, "Particle simulations of radio-frequency glow discharges," IEEE Trans. Plasma Sci., vol. 19, no. 2, pp. 144-156, Apr. 1991.
    • (1991) IEEE Trans. Plasma Sci , vol.19 , Issue.2 , pp. 144-156
    • Surendra, M.1    Graves, D.B.2
  • 17
    • 84984361441 scopus 로고
    • A probe method for determination of time evolution of metastable atoms density in a flowing afterglow plasma
    • J. Pavlík, J. Glosík, M. Sícha, M. Tichý, and P. Potoçek, "A probe method for determination of time evolution of metastable atoms density in a flowing afterglow plasma," Contrib. Plasma Phys., vol. 30, no. 3, pp. 437-448, 1990.
    • (1990) Contrib. Plasma Phys , vol.30 , Issue.3 , pp. 437-448
    • Pavlík, J.1    Glosík, J.2    Sícha, M.3    Tichý, M.4    Potoçek, P.5
  • 18
    • 43349099804 scopus 로고    scopus 로고
    • Gas temperature, electron density and electron temperature measurement in a microwave excited microplasma
    • May
    • X. Zhu, W. Chen, and Y. Pu, "Gas temperature, electron density and electron temperature measurement in a microwave excited microplasma," J. Phys. D, Appl. Phys., vol. 41, no. 10, p. 105 212, May 2008.
    • (2008) J. Phys. D, Appl. Phys , vol.41 , Issue.10 , pp. 105-212
    • Zhu, X.1    Chen, W.2    Pu, Y.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.