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Journal of Physics D: Applied Physics

Volumn 42, Issue 4, 2009, Pages

Supply of a particle-included droplet as laser plasma target for extreme ultraviolet emission

(2) Lin, Jingquan a,b,c Tomie, Toshihisa a

a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST (Japan)

b CHANGCHUN UNIVERSITY OF SCIENCE AND TECHNOLOGY (China)

c UNIVERSITY OF MUNICH (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

DROPLET VELOCITY; EUV EMISSIONS; EUV SOURCE; EXTREME ULTRAVIOLET; EXTREME ULTRAVIOLET EMISSION; HIGH CONVERSION EFFICIENCY; INITIAL STAGES; KEY PARAMETERS; LARGE SIZES; LASER PLASMA; LASER-PLASMA SOURCE; LONG LIFE; MICRO-PARTICLES; NITRIDE PARTICLES; OPERATION TIME; PHOTON ENERGY; PIEZO ACTUATOR; SOLID-STATE MATERIALS; STABLE OPERATION; STANDARD DEVIATION; VIBRATION AMPLITUDE; WATER DROPLETS; WIDE-BAND;

BORON; BORON NITRIDE; CONVERSION EFFICIENCY; DROP FORMATION; EXTREME ULTRAVIOLET LITHOGRAPHY; LASER PRODUCED PLASMAS; LASER PULSES; LASERS; NITRIDES; PLASMA DIAGNOSTICS; PLASMA INTERACTIONS; TIN; ULTRAVIOLET DEVICES;

PLASMA STABILITY;

EID: 67650065778 PISSN: 00223727 EISSN: 13616463 Source Type: Journal
DOI: 10.1088/0022-3727/42/4/045204 Document Type: Article

Times cited : (5)

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