Probing the interface of Fe3 O4 /GaAs thin films by hard x-ray photoelectron spectroscopy

Physical Review B - Condensed Matter and Materials Physics

Volumn 79, Issue 23, 2009, Pages

  Paul, M ^a   Muller A ^a   Ruff, A ^a   Schmid, B ^a   Berner, G ^a   Mertin, M ^b   Sing, M ^a   Claessen, R ^a  

^a UNIVERSITY OF WÜRZBURG   (Germany)

^b HAHN MEITNER INSTITUT   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 67649980022     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.79.233101     Document Type: Article

References (29)

1. A. M. Haghiri-Gosnet, T. Arnal, R. Soulimane, M. Koubaa, and J. P. Renard, Phys. Status Solidi A 201, 1392 (2004). 10.1002/pssa.200304403
2. S. A. Wolf, D. D. Aschwalom, R. A. Buhrman, J. M. Daughton, S. von Molnar, M. L. Roukes, A. Y. Chtchelkanova, and D. M. Treger, Science 294, 1488 (2001). 10.1126/science.1065389
3. A. Yanase and N. Hamada, J. Phys. Soc. Jpn. 68, 1607 (1999). 10.1143/JPSJ.68.1607
4. P. A. Miles, W. B. Westphal, and A. von Hippel, Rev. Mod. Phys. 29, 279 (1957). 10.1103/RevModPhys.29.279
5. G. Schmidt, D. Ferrand, L. W. Molenkamp, A. T. Filip, and B. J. van Wees, Phys. Rev. B 62, R4790 (2000). 10.1103/PhysRevB.62.R4790
6. S. F. Alvarado, M. Erbudak, and P. Munz, Phys. Rev. B 14, 2740 (1976). 10.1103/PhysRevB.14.2740
7. S. A. Morton, G. D. Waddill, S. Kim, I. K. Schuller, S. A. Chambers, and J. G. Tobin, Surf. Sci. 513, L451 (2002). 10.1016/S0039-6028(02)01824-1
8. M. Fonin, R. Pentcheva, Y. S. Dedkov, M. Sperlich, D. V. Vyalikh, M. Scheffler, U. Rüdiger, and G. Güntherodt, Phys. Rev. B 72, 104436 (2005). 10.1103/PhysRevB.72.104436
9. Y. S. Dedkov, U. Rüdiger, and G. Güntherodt, Phys. Rev. B 65, 064417 (2002). 10.1103/PhysRevB.65.064417
10. E. J. Preisler, J. Brooke, N. C. Oldham, and T. C. McGill, J. Vac. Sci. Technol. B 21, 1745 (2003). 10.1116/1.1588648
11. Y. X. Lu, J. S. Claydon, Y. B. Xu, S. M. Thompson, K. Wilson, and G. van der Laan, Phys. Rev. B 70, 233304 (2004). 10.1103/PhysRevB.70.233304
12. S. M. Watts, K. Nakajima, S. van Dijken, and J. M. D. Coey, J. Appl. Phys. 95, 7465 (2004). 10.1063/1.1652418
13. S. Jain, A. O. Adeyeye, and C. B. Boothroyd, J. Appl. Phys. 97, 093713 (2005). 10.1063/1.1889247
14. M. Ferhat and K. Yoh, Appl. Phys. Lett. 90, 112501 (2007). 10.1063/1.2713784
15. T. Taniyama, T. Mori, K. Watanabe, E. Wada, M. Itoh, and H. Yanagihara, J. Appl. Phys. 103, 07D705 (2008). 10.1063/1.2832415
16. K. J. Hubbard and D. G. Schlom, J. Mater. Res. 11, 2757 (1996). 10.1557/JMR.1996.0350
17. S. Tanuma, T. Shiratori, T. Kimura, K. Goto, S. Ichimura, and C. J. Powell, Surf. Interface Anal. 37, 833 (2005). 10.1002/sia.2102
18. Y. B. Xu, E. T. M. Kernohan, D. J. Freeland, A. Ercole, M. Tselepi, and J. A. C. Bland, Phys. Rev. B 58, 890 (1998). 10.1103/PhysRevB.58.890
19. S. A. Chambers, F. Xu, H. W. Chen, I. M. Vitomirov, S. B. Anderson, and J. H. Weaver, Phys. Rev. B 34, 6605 (1986). 10.1103/PhysRevB.34.6605
20. E. Kneedler, P. M. Thibado, B. T. Jonker, B. R. Benett, L. J. Whitman, B. V. Shanabrook, and J. J. Krebs, J. Appl. Phys. 79, 5125 (1996). 10.1063/1.361528
21. S. Gota, J. B. Moussy, M. Henriot, M. J. Guittet, and M. Gautier-Soyer, Surf. Sci. 482-485, 809 (2001). 10.1016/S0039-6028(00)01066-9
22. J. Massies and J. P. Contour, J. Appl. Phys. 58, 806 (1985). 10.1063/1.336175
23. G. Hollinger, R. Skheyta-Kabbani, and M. Gendry, Phys. Rev. B 49, 11159 (1994). 10.1103/PhysRevB.49.11159
24. Z. Liu, Y. Sun, F. Machuca, P. Pianetta, W. E. Spicer, and R. F. W. Pease, J. Vac. Sci. Technol. A 21, 212 (2003). 10.1116/1.1532737
25. P. Liu, T. Kendelewicz, G. E. Brown, E. J. Nelson, and S. A. Chambers, Surf. Sci. 417, 53 (1998). 10.1016/S0039-6028(98)00661-X
26. dov = λsub cosθln (Dsub Iov Dov Isub +1) where λsub is the electron mean-free path, θ is the electron emission angle from the surface normal, Iov and Isub are the XPS peak intensities of overlayer (oxide) and substrate level, and Dov and Dsub are the atomic densities of the element in overlayer and substrate in mol/ cm3.
27. C. W. Wilmsen, J. Vac. Sci. Technol. 19, 279 (1981). 10.1116/1.571118
28. Y. X. Lu, J. S. Claydon, E. Ahmad, Y. B. Xu, S. M. Thompson, K. Wilson, and G. van der Laan, IEEE Trans. Magn. 41, 2808 (2005). 10.1109/TMAG.2005.855158
29. H.-J. Kim, J.-H. Park, and E. Vescovo, Phys. Rev. B 61, 15288 (2000). 10.1103/PhysRevB.61.15288