|
Volumn 311, Issue 14, 2009, Pages 3716-3720
|
Dependence of RF power on the phase transformation for boron nitride films deposited on graphite at room temperature
|
Author keywords
A1. Crystal structure; A3. Physical vapor deposition processes; B1. Nitrides; B2. Semiconducting III V materials
|
Indexed keywords
A1. CRYSTAL STRUCTURE;
A3. PHYSICAL VAPOR DEPOSITION PROCESSES;
APPLIED FIELD;
B1. NITRIDES;
B2. SEMICONDUCTING III-V MATERIALS;
BN FILMS;
BORON NITRIDE FILMS;
CUBIC BORON NITRIDE (CBN);
CUBIC PHASE;
ELECTRON FIELD EMISSION;
GRAPHITE SUBSTRATE;
GROWTH PROCESS;
HIGH EMISSION CURRENT DENSITY;
OPTICAL TRANSMISSION MEASUREMENTS;
PHASE TRANSFORMATION;
RADIO FREQUENCY MAGNETRON SPUTTERING;
RF-POWER;
ROOM TEMPERATURE;
SUBSTRATE HEATING;
TRANSFORMATION MECHANISMS;
ZERO BIAS;
BORON;
CARBON NANOTUBES;
CRYSTAL STRUCTURE;
CUBIC BORON NITRIDE;
FIELD EMISSION;
FILM GROWTH;
GRAPHITE;
MAGNETRON SPUTTERING;
SEMICONDUCTOR GROWTH;
SUBSTRATES;
THICK FILMS;
VAPORS;
BORON NITRIDE;
|
EID: 67649886408
PISSN: 00220248
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jcrysgro.2009.04.041 Document Type: Article |
Times cited : (8)
|
References (30)
|