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Volumn 311, Issue 14, 2009, Pages 3716-3720

Dependence of RF power on the phase transformation for boron nitride films deposited on graphite at room temperature

Author keywords

A1. Crystal structure; A3. Physical vapor deposition processes; B1. Nitrides; B2. Semiconducting III V materials

Indexed keywords

A1. CRYSTAL STRUCTURE; A3. PHYSICAL VAPOR DEPOSITION PROCESSES; APPLIED FIELD; B1. NITRIDES; B2. SEMICONDUCTING III-V MATERIALS; BN FILMS; BORON NITRIDE FILMS; CUBIC BORON NITRIDE (CBN); CUBIC PHASE; ELECTRON FIELD EMISSION; GRAPHITE SUBSTRATE; GROWTH PROCESS; HIGH EMISSION CURRENT DENSITY; OPTICAL TRANSMISSION MEASUREMENTS; PHASE TRANSFORMATION; RADIO FREQUENCY MAGNETRON SPUTTERING; RF-POWER; ROOM TEMPERATURE; SUBSTRATE HEATING; TRANSFORMATION MECHANISMS; ZERO BIAS;

EID: 67649886408     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2009.04.041     Document Type: Article
Times cited : (8)

References (30)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.