Efficient stripping of photoresist on metallized wafers by a pause flow of supercritical fluid

Journal of Hazardous Materials

Volumn 169, Issue 1-3, 2009, Pages 153-157

  Chao, Mu Rong ^a   Chen, Jian Lian ^b  

^a CHUNG SHAN MEDICAL UNIVERSITY   (Taiwan)

^b CHINA MEDICAL UNIVERSITY   (Taiwan)

Author keywords

Extraction; Factorial design; Pause flow; Photoresist; Stripping; Supercritical fluid

Indexed keywords

CONTINUOUS FLOWS; CU LAYERS; DYNAMIC FLOWS; ETHYL-ACETATE; EXTRACTION RATIO; FACTORIAL DESIGN; FACTORIAL EXPERIMENTAL DESIGN; FLOW MODES; INTEGRATED-CIRCUIT PROCESSING; MATRIX; METALLIZATION LAYERS; OPTIMUM CONDITIONS; OPTIMUM PARAMETERS; OVEN TEMPERATURE; PAUSE FLOW; PULSE FLOW; STATIC EQUILIBRIUM; STATIC TIME; STRIPPING; STRIPPING EFFICIENCY;

ALUMINA; ALUMINUM; DISSOLUTION; EFFLUENT TREATMENT; INTEGRATED CIRCUITS; INTERNET PROTOCOLS; MACHINE DESIGN; ORGANIC SOLVENTS; OVENS; PHOTORESISTORS; PHOTORESISTS; SEMICONDUCTOR SWITCHES; STOVES; SUPERCRITICAL FLUIDS; SURFACE TREATMENT;

STRIPPING (DYES);

ACETIC ACID ETHYL ESTER; ALUMINUM; CARBON DIOXIDE; COPPER;

ALUMINUM; COPPER; EXTRACTION METHOD; FLUID FLOW; SUPERCRITICAL FLOW;

ARTICLE; BINDING KINETICS; CARBON DIOXIDE TENSION; DIFFUSION; DISSOLUTION; FLUID FLOW; INTEGRATED CIRCUIT; PROCESS OPTIMIZATION; SOLVENT EXTRACTION; SUPERCRITICAL FLUID; TEMPERATURE MEASUREMENT; WASTE COMPONENT REMOVAL;

ALUMINUM; CHROMATOGRAPHY, SUPERCRITICAL FLUID; CONSERVATION OF NATURAL RESOURCES; COPPER; ELECTRICAL EQUIPMENT AND SUPPLIES; INDUSTRIAL WASTE; METALS;

EID: 67649800352     PISSN: 03043894     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jhazmat.2009.03.092     Document Type: Article

References (20)

1. Luryi S., Xu J., and Zaslavsky A. Future Trends in Microelectronics: The Nano Millennium (2002), IEEE Press/Wiley-Interscience, New York
2. Moore G.E. Cramming more components onto integrated circuits. Electronics 38 (1965) 114-117
3. Williams E.D., Ayres R.U., and Heller M. The 1.7 kilogram microchip: energy and material use in the production of semiconductor devices. Environ. Sci. Technol. 36 (2002) 5504-5510
4. International Technology Roadmap for Semiconductors, Semiconductor Industry Association, San Jose, 2003.
5. King J.W., and Williams L.L. Utilization of critical fluids in processing semiconductors and their related materials. Curr. Opin. Solid State Mater. Sci. 7 (2003) 413-424
6. Weibel G.L., and Ober C.K. An overview of supercritical CO2 applications in microelectronics processing. Microelectron. Eng. 65 (2003) 145-152
7. O'Neil A., and Watkins J.J. Green chemistry in the microelectronics industry. Green Chem. 6 (2004) 363-368
8. Jones C.A., Zweber A., DeYoung J.P., McClain J.B., Carbonelle R., and DeSimone J.M. Applications of "dry" processing in the microelectronics industry using carbon dioxide. Crit. Rev. Solid State Mat. Sci. 29 (2004) 97-109
9. Rubin J.B., Davenhall L.B., Barton L.B., Taylor C.M.V., and Tiefert K. A comparison of chilled DI water/ozone and CO2-basedsupercritical fluids as replacements for photoresist-stripping solvents. IEEE/CMPT Int. Electro Manuf. Technol. Symp. 23rd Institute of Electrical and Electronics Engineers (1998) 308-314
10. J.B. Rubin, L.B. Davenhall, C.M.V. Taylor, L.D. Sivils, T. Pierce, K. Tiefert, Carbon dioxide-based supercritical fluids as IC manufacturing solvents, IEEE International Symposium on Electronics and the Environment, Danver, MA, 1999, pp. 13-20.
11. Frazer L. SCORR one for the environment. Environ. Health Perspect. 109 (2001) A382-A385
12. Rothman L.B., Robey R.J., Ali M.K., and Mount D.J. Supercritical fluid processes for semiconductor device fabrication. IEEE/SEMI Advanced Semiconductor Manufacturing Conference (2002) p372-375
13. Mount D.J., Rothman L.B., Robey R.J., and Ali M.K. The technology behind clearning with supercritical fluid. Solid State Technol. 7 (2002) 103-106
14. Cestari A.R., Vieira E.F.S., and Mota J.A. The removal of an anionic red dye from aqueous solutions using chitosan beads-the role of experimental factors on adsorption using a full factorial design. J. Hazard. Mater. 160 (2008) 337-343
15. Tuzena M., Soylakb M., Citaka D., Ferreirac H.S., Kornc M.G.A., and Bezerrad M.A. A preconcentration system for determination of copper and nickel in water and food samples employing flame atomic absorption spectrometry. J. Hazard. Mater. 162 (2009) 1041-1045
16. Ruggieri F., D'Archivio A.A., Carlucci G., and Mazzeo P. Application of artificial neural networks for prediction of retention factors of triazine herbicides in reversed-phase liquid chromatography. J. Chromatogr. A 1076 (2005) 163-169
17. Guthalugu N.K., Balaraman M., and Kadimi U.S. Optimization of enzymatic hydrolysis of triglycerides in soy deodorized distillate with supercritical carbon dioxide. Biochem. Eng. J. 29 (2006) 220-226
18. Montgomery D.C. Design and Analysis of Experiments. 5th ed. (2001), John Wiley & Sons, New York
19. 2 supercritical fluid. Talanta 70 (2006) 414-418
20. Giddings J.C., Myers M.N., Mclaren L., and Keller R.A. High pressure gas chromatography of nonvolatile species. Science 162 (1968) 67-73