Stripping of photoresist on silicon wafer by CO2 supercritical fluid

Talanta

Volumn 70, Issue 2, 2006, Pages 414-418

  Chen, Jian Lian ^a   Wang, Yeoung Sheng ^a   Kuo, Hsin I ^a   Shu, Dun Ying ^b  

^a CHUNG SHAN MEDICAL UNIVERSITY   (Taiwan)

^b INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE   (Taiwan)

Author keywords

Alloy; Extraction; Factorial experiment design; Photoresist; Stripping; Supercritical

Indexed keywords

ALLOYS; CARBON DIOXIDE; EXTRACTION; PURGING; SILICON WAFERS; SUPERCRITICAL FLUIDS; THERMODYNAMICS;

FACTORIAL EXPERIMENT DESIGN; STRIPPING; SUPERCRITICAL; UV ABSORPTION SPECTROMETRY;

PHOTORESISTS;

EID: 33747135340     PISSN: 00399140     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.talanta.2006.02.066     Document Type: Article

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