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Volumn 20, Issue SUPPL. 1, 2009, Pages
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Morphology and optical properties of zinc oxide thin films grown on Si (100) by metal-organic chemical vapor deposition
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Author keywords
[No Author keywords available]
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Indexed keywords
3D MICROSTRUCTURES;
AXIS ALIGNMENT;
DEEP LEVEL EMISSION;
DEPOSITION TEMPERATURES;
EXCITONIC EMISSION;
HIGH INTENSITY;
LUMINESCENT MECHANISM;
METALORGANIC CHEMICAL VAPOR DEPOSITION;
MOCVD;
NUCLEATION LAYERS;
PL MEASUREMENTS;
POLYCRYSTALLINE WURTZITE;
ROOM-TEMPERATURE PHOTOLUMINESCENCE;
SI (100) SUBSTRATE;
SI(1 0 0);
TEMPERATURE DEPENDENT;
ULTRAVIOLET BANDS;
ZINC OXIDE THIN FILMS;
ZNO;
ZNO FILMS;
AMORPHOUS MATERIALS;
ATMOSPHERIC PRESSURE;
DEPOSITION;
INDUSTRIAL CHEMICALS;
METALLIC FILMS;
METALLORGANIC CHEMICAL VAPOR DEPOSITION;
OPTICAL PROPERTIES;
ORGANIC CHEMICALS;
SCANNING ELECTRON MICROSCOPY;
SEMICONDUCTING SILICON COMPOUNDS;
SEMICONDUCTING ZINC COMPOUNDS;
THIN FILMS;
THREE DIMENSIONAL;
X RAY DIFFRACTION ANALYSIS;
ZINC;
ZINC OXIDE;
ZINC SULFIDE;
OXIDE FILMS;
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EID: 67649282437
PISSN: 09574522
EISSN: 1573482X
Source Type: Journal
DOI: 10.1007/s10854-008-9664-7 Document Type: Conference Paper |
Times cited : (8)
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References (16)
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