SCOPUS 정보 검색 플랫폼

Materials Research Society Symposium Proceedings

Volumn 1059, Issue , 2008, Pages 107-112

Ion beam induced surface modulations from nano to pico: Optimizing deposition during erosion and erosion during deposition

(2) MoberlyChan, Warren John a Schalek, Richard b

a LAWRENCE LIVERMORE NATIONAL LABORATORY (United States)

b HARVARD UNIVERSITY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC SPACING; ATOMICALLY FLAT SURFACE; BEAM INCLINATION; CONTROLLED PARAMETER; DIAMOND SURFACES; DUAL-BEAM; EXTREME CASE; EXTRINSIC PARAMETER; FIB-CVD; FIB/SEM; FOCUSED ION BEAM TECHNOLOGY; GEOMETRIC FACTORS; HIGH DOSE; IN-SITU METROLOGY; ION BEAM PROCESSING; ION SPUTTERING; LINE DEFECTS; MATERIAL SURFACE; MICROELECTRONICS INDUSTRY; ORGANIZED STRUCTURE; REDEPOSITION; RIPPLE FORMATION; SELF ORGANIZING; SITE-SPECIFIC; STEADY STATE; SURFACE MODULATIONS; WAVE MOTIONS;

BEAM PLASMA INTERACTIONS; BOUNDARY CONDITIONS; CHEMICAL VAPOR DEPOSITION; CRYSTALLOGRAPHY; EROSION; ETCHING; FOCUSED ION BEAMS; INDUSTRIAL RESEARCH; ION BEAM ASSISTED DEPOSITION; ION BOMBARDMENT; IONS; MICROELECTRONICS; MODULATION; NANOSTRUCTURES; SPUTTERING; TWO DIMENSIONAL;

SURFACES;

EID: 67649270797 PISSN: 02729172 EISSN: None Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper

Times cited : (1)

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