The activation energy for nanocrystalline diamond films deposited from an Ar/H2/CH4 hot-filament reactor

Journal of Nanoscience and Nanotechnology

Volumn 9, Issue 6, 2009, Pages 3944-3948

  Barbosa, D C ^a   Melo, L L ^a   Trava Airoldi, V J ^a   Corat, E J ^a  

^a INSTITUTO NACIONAL DE PESQUISAS ESPACIAIS   (Brazil)

Author keywords

Activation energy; HFCVD; Microcrystalline diamond; Nanocrystalline diamond

Indexed keywords

CHARACTERIZATION TECHNIQUES; DEPOSITION TIME; GROWTH MECHANISMS; HFCVD; HIGH RESOLUTION; HOT-FILAMENT CHEMICAL VAPOR DEPOSITION; HOT-FILAMENT REACTORS; MICROCRYSTALLINE DIAMOND; NANOCRYSTALLINE DIAMOND; NANOCRYSTALLINE DIAMOND FILMS; NANOCRYSTALLINE DIAMOND THIN FILMS; NANOCRYSTALLINE DIAMONDS; SUBSTRATE TEMPERATURE; TEMPERATURE RANGE;

CHEMICAL VAPOR DEPOSITION; DIAMOND FILMS; DIAMONDS; FILAMENTS (LAMP); HIGH RESOLUTION ELECTRON MICROSCOPY; NANOCRYSTALLINE MATERIALS; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; THERMAL EFFECTS; THIN FILMS;

ACTIVATION ENERGY;

EID: 67649239882     PISSN: 15334880     EISSN: None     Source Type: Journal    
DOI: 10.1166/jnn.2009.NS94     Document Type: Conference Paper

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