Fabrication of highly ordered metallic arrays and silicon pillars with controllable size using nanosphere lithography

Physica E: Low-Dimensional Systems and Nanostructures

Volumn 41, Issue 8, 2009, Pages 1600-1603

  Li, Wei ^a   Zhao, Weiming ^a   Sun, Ping ^a  

^a NANJING UNIVERSITY OF POSTS AND TELECOMMUNICATIONS   (China)

Author keywords

Nanoparticles; Nanosphere lithography; Silicon pillar arrays

Indexed keywords

CONTROLLABLE SIZE; ETCHING TIME; METAL DEPOSITION; METALLIC ARRAYS; METALLIC PARTICLES; NANOSPHERE LITHOGRAPHY; NANOSTRUCTURE ARRAYS; PERIODIC ARRAYS; SCIENCE AND TECHNOLOGY; SILICON PILLAR; SILICON PILLAR ARRAYS; SINGLE LAYER;

LITHOGRAPHY; METALLIC COMPOUNDS; NANOPARTICLES; NANOSPHERES; PLANTS (BOTANY);

REACTIVE ION ETCHING;

EID: 67649205133     PISSN: 13869477     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.physe.2009.05.009     Document Type: Article

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