Conical tungsten stamps for the replication of pore arrays in anodic aluminium oxide films

Nanotechnology

Volumn 20, Issue 24, 2009, Pages

  Leclere, D J ^a   Thompson, G E ^a   Derby, B ^a  

^a UNIVERSITY OF MANCHESTER   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ANODIC ALUMINIUM OXIDE; ELECTROPOLISHED; PORE ARRAYS; SPUTTER COATING; TUNGSTEN MASTER STAMP;

ALUMINUM; ANODIC OXIDATION; TUNGSTEN;

OXIDE FILMS;

ALUMINUM OXIDE; NANOFILM; TUNGSTEN; NANOMATERIAL;

ARTICLE; CHEMICAL PARAMETERS; MATERIAL COATING; NANOARRAY; NANOFABRICATION; NANOPORE; PRESSURE; PRIORITY JOURNAL; SURFACE PROPERTY; ARTIFICIAL MEMBRANE; CHEMISTRY; CONFORMATION; CRYSTALLIZATION; ELECTRODE; MACROMOLECULE; MATERIALS TESTING; METHODOLOGY; NANOTECHNOLOGY; PARTICLE SIZE; POROSITY; ULTRASTRUCTURE;

ALUMINUM OXIDE; CRYSTALLIZATION; ELECTRODES; MACROMOLECULAR SUBSTANCES; MATERIALS TESTING; MEMBRANES, ARTIFICIAL; MOLECULAR CONFORMATION; NANOSTRUCTURES; NANOTECHNOLOGY; PARTICLE SIZE; POROSITY; PRESSURE; SURFACE PROPERTIES; TUNGSTEN;

EID: 67649172537     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/20/24/245304     Document Type: Article

References (13)

1. Choi J, Nielsch K, Reiche M, Wehrspohn R B and Gosele U 2003 J. Vac. Sci. Technol. B 21 763
2. Nielsch K, Wehrspohn R B, Barthel J, Kirschner J, Gosele U, Fischer S F and Kronmuller H 2001 Appl. Phys. Lett. 79 1360
3. Thompson G E and Wood G C 1983 Treatise on Materials Science and Technology vol 23 (London: Academic) pp205-99
4. Masuda H and Satoh M 1996 Japan. J. Appl. Phys. 2 35 L126
5. Shingubara S, Murakami Y, Morimoto K, Sakaue H and Takahagi T 2002 Mater. Res. Soc. Symp. Proc. 705 133
6. Masuda H, Yamada H, Satoh M, Asoh H, Nakao M and Tamamura T 1997 Appl. Phys. Lett. 71 2770
7. Mikulskas I, Juodkazis S, Tomasiunas R and Dumas J G 2001 Adv. Mater. 13 1574
8. Liu C Y, Datta A and Wang Y L 2001 Appl. Phys. Lett. 78 120
9. Choi J, Park Y B and Scherer A 2005 Nanotechnology 16 1655
10. O'sullivan J P and Wood G C 1970 Proc. R. Soc. A 317 511
11. Yanagishita T, Yasui K, Kondo T, Kawamoto Y, Nishio K and Masuda H 2007 Chem. Lett. 36 530
12. Yanagishita T, Kondo T, Nishio K and Masuda H 2008 J. Vac. Sci. Technol. B 26 1856
13. Hwang S K, Jeong S H, Hwang H Y, Lee O J and Lee K H 2002 Korean J. Chem. Eng. 19 467