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Volumn 20, Issue 22, 2009, Pages
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Liquid phase deposition of polymers on arbitrary shaped surfaces and their suitability for e-beam patterning
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Author keywords
[No Author keywords available]
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Indexed keywords
CONCENTRATION OF;
DIELECTRIC SUBSTRATES;
E-BEAM PATTERNING;
ELECTRON-BEAM EXPOSURE;
ETHYL ACRYLATES;
FLAT SURFACES;
LIQUID PHASE DEPOSITION METHOD;
LIQUID-PHASE DEPOSITION;
LOW COSTS;
METHYL METHACRYLATES;
NANOSCALE FEATURES;
POLYMER LAYERS;
POLYMER LIQUIDS;
SENSITIVE POLYMERS;
THICKNESS OF THE FILM;
DIELECTRIC MATERIALS;
ELECTRON BEAM LITHOGRAPHY;
ELECTRON BEAMS;
ELECTRONS;
ESTERS;
LIQUIDS;
MOLECULAR WEIGHT;
POLYMERS;
SUBSTRATES;
POLYMER FILMS;
COPOLYMER;
METHACRYLIC ACID METHYL ESTER;
NANOCOATING;
NANOMATERIAL;
POLY(METHYL METHACRYLATE CO ETHYL ACRYLATE);
POLY(METHYL METHACRYLATE);
UNCLASSIFIED DRUG;
ARTICLE;
CONTROLLED STUDY;
ELECTRON BEAM;
ELECTRON BEAM LITHOGRAPHY;
FILM;
LASER;
LIQUID;
LIQUID PHASE DEPOSITION;
MOLECULAR WEIGHT;
NANOANALYSIS;
NANOTECHNOLOGY;
PRIORITY JOURNAL;
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EID: 67649154126
PISSN: 09574484
EISSN: 13616528
Source Type: Journal
DOI: 10.1088/0957-4484/20/22/225305 Document Type: Article |
Times cited : (6)
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References (16)
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