Structural and magnetic properties of ε -Fe1-x Cox Si thin films deposited via pulsed laser deposition

Applied Physics Letters

Volumn 94, Issue 23, 2009, Pages

  Manyala, Ncholu ^a   Ngom, Balla D ^b,c   Beye, A C ^b   Bucher, Remy ^c   Maaza, Malik ^c   Strydom, Andre ^d   Forbes, Andrew ^e   Johnson, A T Charlie ^f   Ditusa, J F ^g  

^a UNIVERSITY OF PRETORIA   (South Africa)

^b UNIVERSITÉ CHEIKH ANTA DIOP   (Senegal)

^c NATIONAL RESEARCH FOUNDATION   (South Africa)

^d UNIVERSITY OF JOHANNESBURG   (South Africa)

^e DSI CSIR Nanotechnology Innovation Centre   (South Africa)

^f UNIVERSITY OF PENNSYLVANIA   (United States)

^g LOUISIANA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CURRENT PRODUCTION; FERROMAGNETIC THIN FILMS; HELIMAGNETISM; POLYCRYSTALLINE; SI (1 1 1); SINGLE PHASE; STRUCTURAL AND MAGNETIC PROPERTIES; SYNTHESIS AND CHARACTERIZATION; TRANSMISSION ELECTRON;

ATOMIC FORCE MICROSCOPY; FERROMAGNETIC MATERIALS; FERROMAGNETISM; MAGNETIC PROPERTIES; PARAMAGNETISM; PULSED LASER DEPOSITION; SEMICONDUCTING SILICON COMPOUNDS; SILICIDES; SILICON; THIN FILMS;

CRYSTAL ATOMIC STRUCTURE;

EID: 67649124465     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3152766     Document Type: Article

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