Low-threshold ablation of dielectrics irradiated by picosecond soft x-ray laser pulses

Applied Physics Letters

Volumn 94, Issue 23, 2009, Pages

  Faenov, A Ya ^a,b   Inogamov, N A ^c   Zhakhovskii, V V ^b,d   Khokhlov, V A ^c   Nishihara, K ^d   Kato, Y ^a,e   Tanaka, M ^a   Pikuz, T A ^a,b   Kishimoto, M ^a   Ishino, M ^a   Nishikino, M ^a   Nakamura, T ^a   Fukuda, Y ^a   Bulanov, S V ^a   Kawachi, T ^a  

^a JAPAN ATOMIC ENERGY AGENCY   (Japan)

^b JOINT INSTITUTE FOR HIGH TEMPERATURES   (Russian Federation)

^c LANDAU INSTITUTE FOR THEORETICAL PHYSICS   (Russian Federation)

^d OSAKA UNIVERSITY   (Japan)

^e GRADUATE SCHOOL FOR THE CREATION OF NEW PHOTONICS INDUSTRIES   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ABLATION THRESHOLDS; BAND GAPS; ELECTRON HEAT CONDUCTIVITY; FLUENCE; LIF CRYSTAL; LOW THRESHOLDS; PICOSECOND; PULSE DURATIONS; SOFT X-RAY LASER; THERMO-MECHANICAL;

ABLATION; LASER BEAM EFFECTS; LIGHT REFLECTION; THERMAL CONDUCTIVITY; X RAY LASERS;

PULSED LASER APPLICATIONS;

EID: 67649099561     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3152290     Document Type: Article

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