Surface and bulk properties of sputter deposited undoped and Sb-doped SnO2 thin films

Sensors and Actuators, B: Chemical

Volumn 139, Issue 2, 2009, Pages 665-672

  Körber, Christoph ^a   Ágoston, Péter ^a   Klein, Andreas ^a  

^a DARMSTADT UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

Doping; Electrical transport measurement; Photoelectron spectroscopy; Sputter deposition; Surface potentials; Thin films; Tin oxide

Indexed keywords

BULK PROPERTIES; DEPLETION LAYER; DOPING; ELECTRICAL CONDUCTIVITY; ELECTRICAL TRANSPORT MEASUREMENT; ELECTRONIC SURFACE; FLAT BAND; FORMATION ENERGIES; FOUR-POINT; IN-SITU; INTERSTITIALS; OPTICAL TRANSMISSION MEASUREMENTS; OXIDIZING CONDITIONS; OXYGEN CONTENT; POLYCRYSTALLINE; POLYCRYSTALLINE FILM; SB-DOPED; SB-DOPED SNO; SINGLE-CRYSTALLINE; SPUTTER GAS; SURFACE TERMINATION;

DOPING (ADDITIVES); ELECTRIC CONDUCTIVITY; IONIZATION OF GASES; IONIZATION POTENTIAL; OPTICAL CONDUCTIVITY; OXIDE FILMS; OXYGEN; OXYGEN VACANCIES; PHOTOELECTRICITY; PHOTOELECTRON SPECTROSCOPY; PHOTOIONIZATION; PHOTONS; SPECTRUM ANALYSIS; SURFACE POTENTIAL; THIN FILMS; TIN;

SURFACE PROPERTIES;

EID: 67349272013     PISSN: 09254005     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.snb.2009.03.067     Document Type: Article

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