WS2 thin films: Opto-electronic characterization

Journal of Alloys and Compounds

Volumn 479, Issue 1-2, 2009, Pages 657-660

  Hankare, P P ^a   Manikshete, A H ^b   Sathe, D J ^c   Chate, P A ^d   Patil, A A ^a   Garadkar, K M ^a  

^a SHIVAJI UNIVERSITY   (India)

^b Walchand College   (India)

^c KIT's College of Engineering   (India)

^d JSM College   (India)

Author keywords

Crystal morphology; Opto electronic material; Semiconducting material; X ray diffraction

Indexed keywords

ALKALINE MEDIUMS; BAND-GAP ENERGIES; CHEMICAL BATH DEPOSITION METHODS; CRYSTAL MORPHOLOGY; DIRECT BAND GAPS; ELECTRICAL CONDUCTIVITIES; N-TYPE CONDUCTIONS; OPTICAL STUDIES; OPTO-ELECTRONIC MATERIAL; POLY-CRYSTALLINE; ROOM TEMPERATURES; SEM; SEMICONDUCTING MATERIAL; SEMICONDUCTOR THIN FILMS; SPECIFIC ELECTRICAL CONDUCTIVITIES;

DIFFRACTION; ELECTRIC CONDUCTIVITY; ENERGY GAP; MORPHOLOGY; OPTICAL CONDUCTIVITY; OPTICAL MICROSCOPY; SCANNING ELECTRON MICROSCOPY; THIN FILMS; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS;

COLOR FILMS;

EID: 67349226831     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2009.01.024     Document Type: Article

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