Thin films of molybdenum and tungsten disulphides by metal organic chemical vapour deposition

Journal of Materials Science

Volumn 23, Issue 11, 1988, Pages 3981-3986

  Hofmann, Wolfgang K ^a  

^a HAHN MEITNER INSTITUT   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

FILMS--CHEMICAL VAPOR DEPOSITION; MICROSCOPIC EXAMINATION;

MICROWAVE CONDUCTIVITY MEASUREMENTS; MOLYBDENUM DISULFIDE FILMS; PHOTOACTIVITY; TUNGSTEN DISULFIDE FILMS;

SEMICONDUCTOR MATERIALS;

EID: 0024108163     PISSN: 00222461     EISSN: 15734803     Source Type: Journal    
DOI: 10.1007/BF01106824     Document Type: Article

References (21)

1. X-ray Study and Thermoelectric Properties of the W[sub x]Ta[sub 1−x]Se[sub 2] System
2. Chemistry of sputtered molybdenum disulfide films
3. The Deposition of Molybdenum and Tungsten Films from Vapor Decomposition of Carbonyls
4. LAZY PULVERIX, a computer program, for calculating X-ray and neutron diffraction powder patterns
5. Summary Abstract: Fabrication of ultrathin heterostructures with van der Waals epitaxy