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Volumn 86, Issue 7-9, 2009, Pages 1866-1869

Electronic structure of memory traps in silicon nitride

Author keywords

Defects; Silicon nitride; Traps

Indexed keywords

HOLE TRANSPORTS; MEMORY TRAPS; QUANTUM-CHEMICAL SIMULATIONS; SI-SI BONDS; THERMAL IONIZATION; TRAPS;

EID: 67349198454     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2009.03.093     Document Type: Article
Times cited : (62)

References (13)
  • 1
    • 67349262422 scopus 로고    scopus 로고
    • ONO structures in modern microelectronics
    • Material Science, Characterization and Application. Baklanov M.R., Greeen M., and Maex K. (Eds), Wiley&Sons
    • Roizin Y., and Gritsenko V. ONO structures in modern microelectronics. In: Baklanov M.R., Greeen M., and Maex K. (Eds). Material Science, Characterization and Application. Chapter in book Dielectric Films for Advanced Microelectronics (2007), Wiley&Sons
    • (2007) Chapter in book Dielectric Films for Advanced Microelectronics
    • Roizin, Y.1    Gritsenko, V.2
  • 5
    • 0001386996 scopus 로고
    • Kamigaki Y., et al. J. Appl. Phys. 68 5 (1990) 2211-2215
    • (1990) J. Appl. Phys. , vol.68 , Issue.5 , pp. 2211-2215
    • Kamigaki, Y.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.